1
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 31, 2002: US20020160302-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


2
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, November 21, 2002: US20020173680-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


3
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. S Matthew Cairns, Rohm and Haas Electronic Materials, August 4, 2005: US20050170278-A1

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


4
Maricela Morales Charles Szmanda
Peter Trefonas, Gary N Taylor, Charles R Szmanda: Novel polymers and photoresist compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, May 2, 2002: US20020051938-A1

This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are part ...


5
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Dike Bronstein Roberts & Cushman IP Group, c o EDWARDS & ANGELL, October 24, 2002: US20020155380-A1

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


6
Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas III, Wang Yueh: Polymer and photoresist compositions. Shipley Company L L C, S Matthew Cairns, June 18, 2002: US06406828 (19 worldwide citation)

Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia


7
Ed Rutter
Edward W Rutter Jr, Peter Trefonas III, Edward K Pavelchek: Aperture fill. Shipley Company L L C, S Matthew Cairns, October 8, 2002: US06461717 (13 worldwide citation)

Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.


8
Charles Szmanda
Peter Trefonas III, Charles R Szmanda, Gerald C Vizvary: Radiation sensitive composition containing novel dye. Shipley Company L L C, Darryl P Frickey, S Matthew Cairns, Peter F Corless, August 29, 2000: US06110641 (8 worldwide citation)

A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 .mu.m, a crosslinking agent capable of crosslinking the composition when activated by pho ...


9
Charles Szmanda
Charles R Szmanda, Peter Trefonas III: Negative photoresist composition. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, February 2, 1999: US05866299 (6 worldwide citation)

A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capabl ...


10
Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas III, Wang Yueh: Polymer and photoresist compositions. Shipley Company L L C, S Matthew Cairns, July 29, 2003: US06599677 (6 worldwide citation)

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.