1
Louis J Markin, Diane E Kestner, Wojciech M Przezdziecki, Peter J Cowdery Corvan: Thermally processable imaging element comprising an electroconductive layer and a backing layer.. Eastman Kodak Company, Alfred P Lorenzo, May 10, 1994: US05310640 (45 worldwide citation)

Thermally processable imaging elements in which the image is formed by imagewise heating or by imagewise exposure to light followed by uniform heating are provided with both a backing layer and an electroconductive layer to reduce static electricity effects and improve conveyance through processing ...


2
Arunachalam T Ram, Joseph A Manico, Kathleen R Gisser, Peter J Cowdery Corvan, Thomas D Weaver: Time and temperature integrating indicator device. Eastman Kodak Company, Andrew J Anderson, August 15, 2000: US06103351 (40 worldwide citation)

Time and temperature integrating devices for providing a visually observable indication of cumulative thermal exposure are disclosed comprising (a) a substrate having thereon a thermally sensitive image-forming area comprising a combination of (i) an organic silver salt oxidizing agent and (ii) a re ...


3
Cheng Yang, Lyn M Irving, David H Levy, Peter J Cowdery Corvan, Diane C Freeman: Organosiloxane materials for selective area deposition of inorganic materials. Eastman Kodak Company, Chris P Konkol, J Lanny Tucker, September 13, 2011: US08017183 (25 worldwide citation)

An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a deposition inhibitor material to the substrate, wherein the deposition inhibitor material is an organosiloxane compound; and patterning the deposition inhibitor material either after or ...


4
Sharon M Melpolder, Charles C Anderson, Peter J Cowdery Corvan, John F DeCory: Thermally processable imaging element comprising a surface layer that is electroconductive. Eastman Kodak Company, Alfred P Lorenzo, August 20, 1996: US05547821 (18 worldwide citation)

Thermally processable imaging elements in which the image is formed by imagewise heating or by imagewise exposure to light followed by uniform heating are provided with an electroconductive overcoat layer or an electroconductive backing layer or both an electroconductive overcoat layer and an electr ...


5
Peter J Cowdery Corvan, David H Levy, Shelby F Nelson, Diane C Freeman, Thomas D Pawlik: Process for atomic layer deposition. Eastman Kodak Company, J Lanny Tucker, June 26, 2012: US08207063 (12 worldwide citation)

The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising at least first, second, and third gaseous materials, wherein the ...


6
Peter J Cowdery Corvan, David H Levy, Thomas D Pawlik, Diane C Freeman, Shelby F Nelson: Process for making doped zinc oxide. Eastman Kodak Company, Chris P KonKol, J Lanny Tucker, July 5, 2011: US07972898 (10 worldwide citation)

The present invention relates to a process of making a zinc-oxide-based thin film semiconductor, for use in a transistor, comprising thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising first, second, and third gaseous materials, wherein the first ga ...


7
Yun C Chang, Eric R Schmittou, Peter J Cowdery Corvan, Seshadri Jagannathan: Silver nanoparticles made in solvent. Eastman Kodak Company, Andrew J Anderson, Sarah Meeks Roberts, February 12, 2008: US07329301 (8 worldwide citation)

This invention relates to a composition of matter comprising associated predominantly silver nanoparticles, and a method of making the nanoparticles. It further relates to articles comprising the nanoparticles.


8
Lyn M Irving, David H Levy, Diane C Freeman, Cheng Yang, Peter J Cowdery Corvan: Photopatternable deposition inhibitor containing siloxane. Eastman Kodak Company, Chris P KonKol, J Lanny Tucker, December 7, 2010: US07846644 (5 worldwide citation)

An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor m ...


9
Diane C Freeman, David H Levy, Peter J Cowdery Corvan: Process for depositing organic materials. Eastman Kodak Company, J Larry Tucker, Chris P Konkol, December 28, 2010: US07858144 (4 worldwide citation)

A process of making an organic thin film on a substrate by atomic layer deposition is disclosed, the process comprising simultaneously directing a series of gas flows along substantially parallel elongated channels, and wherein the series of gas flows comprises, in order, at least a first reactive g ...


10
Peter J Cowdery Corvan, Roger L Klaus, Franklin D Saeva: Thermally processable imaging element comprising aryliodonium compounds. Eastman Kodak Company, Sarah Meeks Roberts, February 3, 1998: US05714311 (4 worldwide citation)

This invention provides a thermally processable imaging element comprising a support and a thermographic or photothermographic imaging layer, said imaging layer comprising an aryliodonium compound represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 and R.sup.3 are independently H, or al ...