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Paulus Martinus Maria Liebregts, Arno Jan Bleeker, Erik Roelof Loopstra, Harry Borggreve: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, March 22, 2005: US06870601 (13 worldwide citation)

A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.


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Erik Roelof Loopstra, Petrus Rutgerus Bartray, Antonius Johannes Josephus Van Dijsseldonk, Paulus Martinus Maria Liebregts: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 7, 2007: US07253880 (5 worldwide citation)

A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for re ...


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Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert Jan Gerardus Johannes Thomas Brands, Koen Steffens: Lithographic apparatus having parts with a coated film adhered thereto. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 14, 2009: US07561250 (4 worldwide citation)

A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a subst ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M Mertens, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 21, 2012: US08248577 (3 worldwide citation)

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead ...


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Bernardus Antonius Johannes Luttikhuis, Petrus Rutgerus Bartray, Johannes Henricus Wilhelmus Jacobs, Thijs Harink, Paulus Martinus Maria Liebregts: Lithographic apparatus and a device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 24, 2006: US07126664 (3 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project t ...


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Paulus Martinus Maria Liebregts, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk: Lithographic apparatus and device and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 12, 2011: US07924403 (2 worldwide citation)

A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to varia ...


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Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniël Jozef Maria Direcks, Gert Jan Gerardus Johannes Thomas Brands: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 10, 2012: US08218126 (2 worldwide citation)

A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part ...