1
Paul S Gilman, Arun D Jatkar, Stephen Donachie, Winfred L Woodard III, Walter E Mattson: Formation of intermetallic and intermetallic-type precursor alloys for subsequent mechanical alloying applications. Inco Alloys International, Raymond J Kenny, Edward A Steen, May 26, 1987: US04668470 (51 worldwide citation)

A method for forming intermetallic and intermetallic-type precursor alloys for subsequent mechanical alloying applications. Elemental powders are blended in proportions approximately equal to their respective intermetallic compounds. Heating of the blend results in the formation of intermetallic com ...


2
Thomas J Hunt, Paul S Gilman: Sputter target/backing plate assembly and method of making same. Sony Corporation, Materials Research Corporation, Wood Herron & Evans L, November 17, 1998: US05836506 (47 worldwide citation)

This invention is directed to an improved method for making a bonded sputter target/backing plate assembly as well as assemblies produced therefrom. The assembly includes a sputter target having a bonding surface which is bonded to the bonding surface of an underlying backing plate. The method of fo ...


3
Paul S Gilman, Walter E Mattson: Production of mechanically alloyed powder. Inco Alloys International, Miriam W Leff, Raymond J Kenny, December 9, 1986: US04627959 (42 worldwide citation)

An improved method is provided for producing mechanically alloyed powders on a commercial scale comprising milling the components of the powder product in a gravity-dependent-type ball mill to produce a powder having a characteristic apparent density. Powder so produced will have reached an acceptab ...


4
Holger J Koenigsmann, Paul S Gilman: Textured-grain-powder metallurgy tantalum sputter target. Praxair S T Technology, Iurie A Schwartz, August 3, 2004: US06770154 (40 worldwide citation)

The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The tantalum grains have at least a 40 ...


5
Chi Fung Lo, Paul S Gilman, Darryl Draper: Method of making high-density, high-purity tungsten sputter targets. Praxair Technology, Blake T Beiderman, December 11, 2001: US06328927 (39 worldwide citation)

A method is provided for fabricating tungsten sputter targets having a density of at least about 97% of theoretical density and an oxygen content of at least about 100 ppm less than the starting powder. According to the principles of the present invention, a tungsten powder having a powder size less ...


6
Thomas J Hunt, Paul S Gilman: Sputter target/backing plate assembly and method of making same. Praxair S T Technology, Wood Herron & Evans L, June 13, 2000: US06073830 (37 worldwide citation)

This invention is directed to an improved bonded sputter target/backing plate assembly and a method of making these assemblies. The assembly includes a sputter target having side and bottom bonding surfaces bonded within a recess in an underlying backing plate, the recess having top and side bonding ...


7
Thomas J Hunt, Paul S Gilman, James E Joyce, Chi Fung Lo, Darryl Draper: Cryogenic annealing of sputtering targets. Praxair S T Technology, Wood Herron & Evans L, May 2, 2000: US06056857 (37 worldwide citation)

Sputtering targets are cryogenically annealed to provide a uniformly dense molecular structure by placing the target in a temperature-controlled cryogenic chamber and cooling the chamber to a cryogenic temperature at a controlled rate. The target is maintained at a cryogenic temperature to cryogenic ...


8
Arun D Jatkar, Paul S Gilman, Raymond C Benn: Mechanical alloying. Inco Alloys International, Francis J Mulligan Jr, Raymond J Kenny, November 25, 1986: US04624705 (32 worldwide citation)

Aluminum-base alloys and a method of preparing aluminum-base alloys by mechanical alloying in the presence of a carbidiferous processing aid wherein a strong carbide former such as titanium is included so as to produce carbides in the final alloy more thermally stable at temperatures in excess of 10 ...


9
Holger J Koenigsmann, Paul S Gilman: Textured-grain-powder metallurgy tantalum sputter target. Praxair S T Technology, Iurie A Schwartz, July 25, 2006: US07081148 (27 worldwide citation)

The sputter target includes a tantalum body having tantalum grains formed from consolidating tantalum powder and a sputter face. The sputter face has an atom transport direction for transporting tantalum atoms away from the sputter face for coating a substrate. The tantalum grains have at least a 40 ...


10
Chi Fung Lo, Darryl Draper, Paul S Gilman: Method of making high density sputtering targets. Praxair S T Technology, Blake T Biederman, December 26, 2000: US06165413 (26 worldwide citation)

There is provided a method for fabricating high density sputter targets by pre-packing a powder bed by hot pressing or vibration between metal plates, followed by hot isostatic pressing. This method is especially suitable for preparing sputter targets with a radius to thickness ratio of at least 3 a ...