1
Paul Brunemeier, Ph.D.
Paul E Brunemeier, Archita Sengupta, Justin F Gaynor, Robert H Havemann: Inhomogeneous materials having physical properties decoupled from desired functions. Novellus Systems, Silicon Valley Patent Group, March 29, 2005: US06873026 (16 worldwide citation)

A composition comprises a first component that provides a predetermined response to radiation, and a second component. Upon curing of the composition, portions of the first component bind together portions of the second component to form an inhomogeneous material having physical properties substanti ...


2
Paul E Brunemeier, Thomas Miu: Plasma-enhanced flash process. Lam Research Corporation, Beyer & Weaver, February 9, 1999: US05869401 (20 worldwide citation)

A method in a plasma processing chamber, the chamber being employed for processing a substrate, for removing corrosive species from the plasma processing chamber after the substrate is processed. The method includes introducing a flash source gas comprising an oxidizing agent such as oxygen into the ...


3
Ronald D Remba, Paul E Brunemeier, Bruce C Schmukler, Walter A Strifler, Daniel H Rosenblatt: Method of fabricating group III-V compound. Watkins Johnson Company, Flehr Hohbach Test Albritton & Herbert, December 20, 1994: US05374328 (8 worldwide citation)

A solution of hydrogen peroxide [H.sub.2 O.sub.2 ], citric acid [HOC(CH.sub.2 COOH).sub.2 COOH.H.sub.2 O], and a salt of citric acid such as potassium citrate [HOC(CH.sub.2 COOK).sub.2 COOK.H.sub.2 O], and hydrogen peroxide [H.sub.2 O.sub.2 ], in a proper pH range, selectively etches GaAs-containing ...


4
Ronald E Remba, Paul E Brunemeier, Bruce C Schmukler, Walter A Strifler, Daniel H Rosenblatt: Method of fabricating Group III-V compound semiconductor devices using selective etching. Watkins Johnson Company, Flehr Hohbach Test Albritton & Herbert, April 6, 1999: USRE036185

A solution of hydrogen peroxide �H.sub.2 O.sub.2 !, citric acid �HOC(CH.sub.2 COOH).sub.2 COOH.H.sub.2 O!, and a salt of citric acid such as potassium citrate �HOC(CH.sub.2 COOK).sub.2 COOK.H.sub.2 O!, and hydrogen peroxide �H.sub.2 O.sub.2 !, in a proper pH range, selectively etches GaAs-containing ...



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