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Jeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Maria Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 24, 2010: US07779781 (28 worldwide citation)

In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.


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Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411653 (26 worldwide citation)

Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may r ...


3
Theodorus Petrus Maria Cadee, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov, Marco Koert Stavenga, Martin Frans Pierre Smeets, Aschwin Lodewijk Hendricus Johannes Van Meer, Bart Leonard Peter Schoondermark, Patricius Aloysius Jacobus Tinnemans, Stoyan Nihtianov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 4, 2007: US07304715 (24 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patt ...


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Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan Gerard Cornelis Van Der Toorn: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 31, 2012: US08233135 (18 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to p ...


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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johaannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 27, 2008: US07379155 (17 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...


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Patricius Aloysius Jacobus Tinnemans, Johannes Jacobus Matheus Baselmans: Lithographic apparatus and device manufacturing method utilizing data filtering. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 22, 2008: US07403265 (14 worldwide citation)

An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning devi ...


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Marcel Bontekoe, Patricius Aloysius Jacobus Tinnemans, Lambertus Gerardus Maria Kessels, Marco Cornelis Jacobus Martinus Van Hassel, Wouter Frans Willem Mulckhuyse: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, January 8, 2008: US07317510 (11 worldwide citation)

A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested do ...


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Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan Gerard Cornelis Van Der Toorn: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 22, 2008: US07403261 (8 worldwide citation)

The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid su ...


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Patricius Aloysius Jacobus Tinnemans, Johannes Jacobus Matheus Baselmans, Laurentius Catrinus Jorritsma: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 3, 2007: US07239373 (6 worldwide citation)

A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path includi ...