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Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


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Omura Yasuhiro: (Ja) 投影光学系、露光装置及び露光方法, (En) Projection optical system, and exposure apparatus and exposure method. Nikon Corporation, Omura Yasuhiro, HASEGAWA Yoshiki, December 9, 2004: WO/2004/107011 (135 worldwide citation)

(EN) A projection optical system of reflection/refraction type having an image forming ability thanks to favorable correction of the aberrations such as color aberration and field curvature, having a favorably reduced reflection loss at the reflective surfaces, and having a large effective image-sid ...


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Omura Yasuhiro: Cata-dioptic system and projection exposure device equipped with the same system. Nikon, April 18, 2003: JP2003-114387 (71 worldwide citation)

PROBLEM TO BE SOLVED: To provide a cata-dioptic system which has aberrations compensated excellently even in the ultra ultraviolet range without using any large-diameter field lens and has high resolving power and a projection exposure device equipped with the optical system.SOLUTION: The cata-diopt ...


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Omura Yasuhiro: Projection optical system, and exposure apparatus and exposure method. Nippon Kogaku, March 1, 2006: EP1630585-A1 (67 worldwide citation)

A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, a ...


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Omura Yasuhiro: Catadioptric lens system. Nippon Kogaku, January 7, 1998: EP0816892-A2 (48 worldwide citation)

A catadioptric lens system whose entire size is practically compact and is capable of providing a large numerical aperture in the ultraviolet band region is disclosed. The invention also provides photolithographic resolution of quarter micron levels and is easy to manufacture. The invention comprise ...


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Omura Yasuhiro: Projection exposure method and apparatus and projection optical system. Nippon Kogaku, October 4, 2001: EP1139138-A1 (44 worldwide citation)

Provided is a dioptric projection.optical system favorably applicable to projection exposure apparatus used in the lithography step in fabrication of microdevices such as semiconductor devices. This projection optical system includes a positive, front lens unit (GF), an aperture stop (AS), and a pos ...


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Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure apparatus, and exposure method. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko, YAMAGUCHI Takao, November 11, 2004: WO/2004/097911 (37 worldwide citation)

(EN) An exposure apparatus for high-resolution projection exposure with a high throughput by using an easily producible projection optical system of refraction type and a mask having an ordinal size, disposing a high refractive index medium in the optical path between the projection optical system a ...


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Omura Yasuhiro: Optical projection system and projection exposure device equipped with the system. Nikon, July 6, 2001: JP2001-185480 (35 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection optical system having a large numerical aperture in the soft X-ray wavelength region of less than 200 nm, especially less than 100 nm and a resolution that is far less than 50 nm, and a projection exposure device equipped with an optical projection syste ...


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Omura Yasuhiro: Catadioptric image-formation optical system, exposure device, and exposure method. Nikon, November 11, 2004: JP2004-317534 (32 worldwide citation)

PROBLEM TO BE SOLVED: To provide a catadioptric image-formation optical system which has a relatively large numerical aperture in a vacuum ultraviolet-ray wavelength band and is easily optically adjusted and mechanically designed and has various aberrations including chromatic aberration sufficientl ...


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Omura Yasuhiro: Catadioptric projection optical system, projection aligner, and exposure method. Nikon, November 25, 2004: JP2004-333761 (29 worldwide citation)

PROBLEM TO BE SOLVED: To provide a relatively compact projection optical system that has an improved imaging performance while aberrations, such as chromatic aberrations and image surface curve, are appropriately corrected, and can secure a large number of effective image-side numerical apertures by ...