1
Sjoerd Nicolaas Lambertus Donders, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner: Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method. ASML Netherlands, Stichting Nationaal Lucht—en Ruimtevaartlaboratorium, Pillsbury Winthrop Shaw Pittman, December 17, 2013: US08610089 (7 worldwide citation)

A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid li ...


2
Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns: Radiation source, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 5, 2009: US07528395 (6 worldwide citation)

A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. T ...


3
Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op T Root: Electron injector and free electron laser. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, August 8, 2017: US09728931 (2 worldwide citation)

An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunche ...


4
Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen: Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, May 27, 2014: US08736806 (2 worldwide citation)

A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of ...


5
Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen: Radiation system and lithographic apparatus comprising the same. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, June 2, 2009: US07541603 (2 worldwide citation)

An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be ...


6
Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Olav Waldemar Vladimir Frijns: Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 26, 2006: US07113261 (2 worldwide citation)

A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam ...


7
Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev: Source-collector device, lithographic apparatus, and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, August 9, 2016: US09411238 (1 worldwide citation)

A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulat ...


8
Wilhelmus Josephus Box, Harm Jan Voorma, Olav Waldemar Vladimir Frijns, Maurice Piërre Marie Arthur Limpens: Lithographic apparatus, device manufacturing method and radiation collector. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 30, 2008: US07470916 (1 worldwide citation)

A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.


9
Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko: Lithographic method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, November 21, 2017: US09823572

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the powe ...


10
Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op T Root: Electron injector and free electron laser. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, October 16, 2018: US10103508

A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of ...