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Yoshinori Fujimori, Jun Momma, Tomiya Sasaki, Hideo Iwasaki, Toshiya Sakamoto, Hiroshi Endo, Katsumi Hisano, Naoyuki Sori, Kazumi Shimotori, Noriaki Yagi, Hiromi Shizu, Takashi Sano: Thermal conductivity sheet. Kabushiki Kaisha Toshiba, Foley & Lardner, August 26, 1997: US05660917 (77 worldwide citation)

A thermal conductivity sheet is provided which is superior all in heat radiating characteristics (thermal conductivity) in the direction of sheet thickness, close-contact with respect to parts to be cooled, and electrical insulation. In a thermal conductivity sheet 1 in which a plurality of highly t ...


2
Hiroyuki Hasebe, Shusuke Inada, Yoshiyuki Isozaki, Takamichi Inaba, Takao Sawa, Hiromichi Horie, Noriaki Yagi, Hiromi Shizu, Yoshiko Kanazawa: Hydrogen-absorbing alloy for battery, method of manufacturing the same, and secondary nickel-metal hydride battery. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, August 5, 1997: US05654115 (53 worldwide citation)

A hydrogen-absorbing alloy for battery according to the present invention comprises an alloy having the composition represented by a general formula A Ni.sub.a Mn.sub.b M.sub.c [where, A is at least one kind of element selected from rare earth elements including Y (yttrium), M is a metal mainly comp ...


3
Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Noriaki Yagi, Nobuhiro Saitoh: Method of cleaning an object. Kabushiki Kaisha Toshiba, Japan Field Company, Foley & Lardner, April 2, 1996: US05503681 (50 worldwide citation)

An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agen ...


4
Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa: Cleaning compositions. Toshiba Silicone, Foley & Lardner, November 2, 1999: US05977040 (47 worldwide citation)

A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different grou ...


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Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa: Cleaning compositions. Toshiba Silicone, Foley & Lardner, November 16, 1999: US05985810 (45 worldwide citation)

A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different grou ...


6
Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa: Cleaning compositions. Toshiba Silicone, Foley & Lardner, October 24, 2000: US06136766 (43 worldwide citation)

A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different grou ...


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Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa: Cleaning compositions. Kabushiki Kaisha Toshiba, Foley & Lardner, August 22, 1995: US05443747 (40 worldwide citation)

A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different grou ...


8
Takashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Takashi Yamanobe, Toshihiro Maki, Noriaki Yagi, Shigeru Ando: Highly purified metal material and sputtering target using the same. Kabushiki Kaisha Toshiba, Foley & Lardner, March 23, 1993: US05196916 (34 worldwide citation)

This is a highly purified metal comprising one metal selected from the group consisted of titanium, zirconium and hafnium. The highly purified metal has an Al content of not more than 10 ppm. It also has an oxygen content of not more than 250 ppm, each of Fe, Ni and Cr contents not more than 10 ppm ...


9
Takashi Ishigami, Koichi Watanabe, Akihisa Nitta, Toshihiro Maki, Noriaki Yagi: Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same. Kabushiki Kaisha Toshiba, Finnegan Henderson Farabow Garrett & Dunner L, December 11, 2001: US06329275 (26 worldwide citation)

An interconnector line of thin film comprising 0.001 to 30 at % of at least one kind of a first element capable of constituting an intermetallic compound of aluminum and/or having a higher standard electrode potential than aluminum, for example, at least one kind of the first element selected from Y ...


10
Minoru Inada, Kimiaki Kabuki, Yasutaka Imajo, Takayuki Oguni, Noriaki Yagi, Nobuhiro Saitoh, Akitsugu Kurita, Yoshiaki Takezawa: Continuous method for cleaning industrial parts using a polyorganosiloxane. Kabushiki Kaisha Toshiba, Foley & Lardner, April 21, 1998: US05741365 (24 worldwide citation)

A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.