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NOLLER Bastian, LAUTER Michael, SUGIHARTO Albert Budiman, LI Yuzhuo, RUSHING Kenneth, FRANZ Diana, BÖHN Roland: COMPOSITION DE POLISSAGE CHIMIQUE-MÉCANIQUE (CMP) COMPRENANT DEUX TYPES DINHIBITEURS DE CORROSION, A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING TWO TYPES OF CORROSION INHIBITORS. BASF SE, NOLLER Bastian, LAUTER Michael, SUGIHARTO Albert Budiman, LI Yuzhuo, RUSHING Kenneth, FRANZ Diana, BÖHN Roland, BASF, September 27, 2012: WO/2012/127399 (3 worldwide citation)

A chemical-mechanical polishing ("CMP") composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of A/-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group c ...


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NOLLER BASTIAN, LAUTER MICHAEL, SUGIHARTO ALBERT BUDIMAN, LI YUZHUO, RUSHING KENNETH, FRANZ DIANA, BOEHN ROLAND: Composition de polissage chimico-mécanique comprenant deux types dinhibiteurs de la corrosion, Chemisch-mechanische Polierzusammensetzung mit zwei Arten von Korrosionshemmern, A chemical mechanical polishing (cmp) composition comprising two types of corrosion inhibitors. BASF SE, September 26, 2012: EP2502969-A1

A chemical-mechanical polishing ("CMP") composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of N-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group co ...


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NOLLER BASTIAN MARTEN, LI YUZHUO, FRANZ DIANA, RUSHING KENNETH, LAUTER MICHAEL, SHEN DANIEL KWO HUNG, LAN YONGQING, BAO ZHENYU: Composition pour polissage mécanique chimique comportant un polyamine polymérique, Chemisch-mechanische Polierzusammensetzung enthaltend Polymerpolyamin, A chemical mechanical polishing (cmp) composition comprising a polymeric polyamine. BASF SE, September 26, 2012: EP2502970-A1

A chemical-mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a composite or mixture thereof, (B) a polymeric polyamine or a salt thereof comprising at least one type of pendant group (Y) which comprises at least one moiety (Z), wherein (Z) is a carboxyl ...


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NOLLER BASTIAN MARTEN, LI YUZHUO, FRANZ DIANA, RUSHING KENNETH, LAUTER MICHAEL, SHEN DANIEL KWO HUNG, LAN YONGQING, BAO ZHENYU: Composition pour polissage mécanique chimique comportant un polyamine polymérique, Chemisch-mechanische Polierzusammensetzung mit Polymerpolyamin, A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLYMERIC POLYAMINE. BASF SE, October 31, 2012: EP2518120-A1

A chemical-mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a composite or mixture thereof, (B) a polymeric polyamine or a salt thereof comprising at least one type of pendant group (Y) which comprises at least one moiety (Z), wherein (Z) is a carboxyl ...