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Nobuyuki Takahashi, Hiroaki Kitahara: Substrate processing apparatus. Anelva Corporation, Pollock VandeSande & Priddy, May 2, 1989: US04825808 (142 worldwide citation)

A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the ...


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Hiroshi Torihara, Takayoshi Tanabe, Kenichi Ukai, Nobuyuki Takahashi: Illumination device, method for driving the illumination device and display including the illumination device. Sharp Kabushiki Kaisha, Nixon & Vanderhye P C, May 23, 2000: US06066920 (110 worldwide citation)

An illumination device includes a cold cathode fluorescent tube having a heat capacity of 0.035 Wsec/.degree. C. or less per unit length (1 cm) of a glass tube of a fluorescent section of the cold cathode fluorescent tube. The illumination device has a superior operation characteristic at a low temp ...


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Hideki Tateishi, Tsuneaki Kamei, Katsuo Abe, Shigeru Kobayashi, Susumu Aiuchi, Masashi Nakatsukasa, Nobuyuki Takahashi, Ryuji Sugimoto: Apparatus for performing continuous treatment in vacuum. Hitachi, Anelva Corporation, Antonelli Terry & Wands, September 20, 1983: US04405435 (103 worldwide citation)

An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively tran ...


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Nobuyuki Takahashi, Ryuji Sugimoto, Yasuyuki Shirai: Automatic loader. Anelva Corporation, Townsend & Townsend, February 17, 1987: US04643629 (97 worldwide citation)

In an automatic loader for automatically loading a flat unprocessed substrate to a substrate processing apparatus for processing the flat substrate and automatically unloading a processed substrate, the automatic loader has: a plurality of cassette stages for vertically moving cassettes having a plu ...


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Shinya Hasegawa, Shigeru Mizuno, Kazuhito Watanabe, Nobuyuki Takahashi, Manabu Tagami, Takanori Yoshimura, Hajime Sahase: CVD apparatus. Anelva Corporation, Burns Doane Swecker & Mathis, October 14, 1997: US05676758 (84 worldwide citation)

A CVD mechanism includes a reactor, a substrate holder, a heating apparatus for heating the substrate holder, a reaction gas supply plate for supplying reaction gas into the reactor, and at least two cylinders disposed in a concentric form on the substrate-facing surface of the reaction gas supply p ...


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Hisashi Oyama, Youko Ohta, Kenichi Ukai, Nobuyuki Takahashi, Takayoshi Tanabe, Hirohide Terasaki: Lighting apparatus. Sharp Kabushiki Kaisha, David G Conlin, Peter F Dike Bronstein Roberts & Cushman Corless, September 15, 1998: US05808708 (72 worldwide citation)

A lighting apparatus for irradiating a liquid crystal display panel from the back includes a light guiding plate having at least an end which is bent in a direction opposite to the liquid crystal display panel, and a light source disposed on the back surface of the light guiding plate with respect t ...


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Shigeru Mizuno, Yoshihiro Katsumata, Nobuyuki Takahashi: Integrated module multi-chamber CVD processing system and its method for processing substrates. Anelva Corporation, Burns Doane Swecker & Mathis, February 27, 1996: US05494494 (68 worldwide citation)

In a CVD processing system for depositing a blanket tungsten film, a distinct shadow is formed without causing any micro-peeling when the substrate fixture is separated from the substrate so as to prevent any blanket tungsten from being deposited on SiO.sub.2, thus reducing the occurrence of fine du ...


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Hiroshi Torihara, Kenichi Ukai, Nobuyuki Takahashi: Backlighting device and a method of manufacturing the same, and a liquid crystal display apparatus. Sharp Kabushiki Kaisha, Nixon & Vanderhye P C, July 2, 2002: US06412969 (66 worldwide citation)

A backlighting device including: a light guide unit formed as a substantially flat panel of a first resin material having opposing surfaces and side faces, the light guide unit having a light guide section, wherein light enters the light guide unit through at least one of the side faces and is emitt ...


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Masahiko Kobayashi, Nobuyuki Takahashi: Sputtering device and sputtering method. Anelva Corporation, Burns Doane Swecker & Mathis, June 20, 2000: US06077403 (65 worldwide citation)

A sputtering device includes a chamber equipped with an exhaust system. A sputtering power source applies specific high frequency electric power to the target. A supplemental electrode is provided so that it surrounds the flight path of sputter particles between the target and a substrate. The suppl ...


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