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Nobuyuki Takahashi, Hiroaki Kitahara: Substrate processing apparatus. Anelva Corporation, Pollock VandeSande & Priddy, May 2, 1989: US04825808 (133 worldwide citation)

A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the ...


2
Hideki Tateishi, Tsuneaki Kamei, Katsuo Abe, Shigeru Kobayashi, Susumu Aiuchi, Masashi Nakatsukasa, Nobuyuki Takahashi, Ryuji Sugimoto: Apparatus for performing continuous treatment in vacuum. Hitachi, Anelva Corporation, Antonelli Terry & Wands, September 20, 1983: US04405435 (100 worldwide citation)

An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively tran ...


3
Hiroshi Torihara, Takayoshi Tanabe, Kenichi Ukai, Nobuyuki Takahashi: Illumination device, method for driving the illumination device and display including the illumination device. Sharp Kabushiki Kaisha, Nixon & Vanderhye P C, May 23, 2000: US06066920 (96 worldwide citation)

An illumination device includes a cold cathode fluorescent tube having a heat capacity of 0.035 Wsec/.degree. C. or less per unit length (1 cm) of a glass tube of a fluorescent section of the cold cathode fluorescent tube. The illumination device has a superior operation characteristic at a low temp ...


4
Nobuyuki Takahashi, Ryuji Sugimoto, Yasuyuki Shirai: Automatic loader. Anelva Corporation, Townsend & Townsend, February 17, 1987: US04643629 (89 worldwide citation)

In an automatic loader for automatically loading a flat unprocessed substrate to a substrate processing apparatus for processing the flat substrate and automatically unloading a processed substrate, the automatic loader has: a plurality of cassette stages for vertically moving cassettes having a plu ...


5
Hisashi Oyama, Youko Ohta, Kenichi Ukai, Nobuyuki Takahashi, Takayoshi Tanabe, Hirohide Terasaki: Lighting apparatus. Sharp Kabushiki Kaisha, David G Conlin, Peter F Dike Bronstein Roberts & Cushman Corless, September 15, 1998: US05808708 (67 worldwide citation)

A lighting apparatus for irradiating a liquid crystal display panel from the back includes a light guiding plate having at least an end which is bent in a direction opposite to the liquid crystal display panel, and a light source disposed on the back surface of the light guiding plate with respect t ...


6
Hiroshi Torihara, Kenichi Ukai, Nobuyuki Takahashi: Backlighting device and a method of manufacturing the same, and a liquid crystal display apparatus. Sharp Kabushiki Kaisha, Nixon & Vanderhye P C, July 2, 2002: US06412969 (64 worldwide citation)

A backlighting device including: a light guide unit formed as a substantially flat panel of a first resin material having opposing surfaces and side faces, the light guide unit having a light guide section, wherein light enters the light guide unit through at least one of the side faces and is emitt ...


7
Minoru Namiki, Nobuyuki Takahashi: Multi-chamber integrated process system. Anelva Corporation, Burns Doane Swecker & Mathis, February 22, 1994: US05288379 (55 worldwide citation)

A vacuum processing apparatus capable of quickly replacing a substrate without opening the two gate valves simultaneously by using two waiting stages and a single transferring robot. The transferring robot is designed to transfer a substrate in a straight-line direction, and those two holding stages ...


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Masahiko Kobayashi, Nobuyuki Takahashi: Sputtering device and sputtering method. Anelva Corporation, Burns Doane Swecker & Mathis, June 20, 2000: US06077403 (53 worldwide citation)

A sputtering device includes a chamber equipped with an exhaust system. A sputtering power source applies specific high frequency electric power to the target. A supplemental electrode is provided so that it surrounds the flight path of sputter particles between the target and a substrate. The suppl ...


10
Nobuo Fukushima, Takayoshi Adachi, Nobuyuki Takahashi, Kazuaki Sakakura: Extrusion coating method with polyolefin foam. Sumitomo Chemical Company, Cushman Darby & Cushman, March 27, 1979: US04146562 (47 worldwide citation)

Disclosed is a method for continuous extrusion coating of a hollow core material with a highly expanded polyolefin resin, which is characterized by subjecting an extruded molten mass of an expandable polyolefin resin to external cooling at the point at which said molten mass begins to foam and suppl ...



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