1
Hirohito Itoh, Shinji Ohishi, Kazunori Iwamoto, Nobushige Korenaga, Youzou Fukagawa, Toshiya Asano, Satoru Takahashi: Stage device and pattern transfer system using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 4, 1997: US05684856 (57 worldwide citation)

A stage device includes a first, fine-motion driving system for moving a movable stage through a first range; and a second, relatively rough-motion driving system for moving the movable stage through a second range which is substantially of the same extent as the first range.


2
Nobushige Korenaga, Kazunori Iwamoto: Support device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 21, 1995: US05467720 (45 worldwide citation)

A supporting device for supporting a member having an inside movable portion includes a main frame, a supporting reference plate on which the member is to be placed and a plurality of driving mechanisms each being disposed between the main frame and the supporting reference plate and each having a h ...


3
Nobushige Korenaga, Mitsuru Inoue: Scanning exposure apparatus and device manufacturing method using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 9, 2001: US06172738 (39 worldwide citation)

A scanning exposure apparatus includes a projection optical system, a reticle stage for scanningly moving a reticle relative to the projection optical system a wafer stage for scanningly moving a wafer relative to the projection optical system, in a timed relation with the reticle scan movement, and ...


4
Nobushige Korenaga, Shuichi Yabu: Stage apparatus, and exposure apparatus and device manufacturing method using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, July 2, 2002: US06414742 (36 worldwide citation)

A stage apparatus includes a movable stage, a base supporting the stage on a reference plane, a driving mechanism for driving the stage, and a rotor acting on the stage and producing a moment so as to reduce a reaction force produced along with the movement of the stage. The rotor also reduces the r ...


5
Nobushige Korenaga: Linear motor mechanism for exposure apparatus, and device manufacturing method using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 22, 2000: US06107703 (35 worldwide citation)

A linear motor mechanism includes a stator element and a movable element being movable relative to the stator element in a predetermined direction through an electromagnetic drive force, wherein the stator element includes a yoke and coils disposed along a predetermined direction while the movable e ...


6
Nobushige Korenaga: Linear motor coil for exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, July 24, 2001: US06265793 (33 worldwide citation)

A conductive foil is wound into a roll to provide a roll coil, and the roll coil is cut along wire paths, whereby a flat coil with a level difference is produced. Similarly, a flat coil without a level difference is sliced from the roll coil. The flat coil with a level difference and the flat coil w ...


7
Nobushige Korenaga: Stage device, exposure apparatus using the same, and device production method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 14, 1999: US06002465 (27 worldwide citation)

A stage device includes a table, a first stage movable in a first direction on the table, a first linear motor for driving the first stage, the first linear motor including a movable portion and a stationary portion, a second stage movable in a second direction with respect to the first stage, a sec ...


8
Nobushige Korenaga, Ryuichi Ebinuma: Stage system and stage driving method for use in exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 27, 2003: US06570645 (24 worldwide citation)

A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one ...


9
Nobushige Korenaga, Ryuichi Ebinuma: Stage apparatus and linear motor, and exposure apparatus and device production method using the stage apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 14, 2000: US06037680 (23 worldwide citation)

A linear motor includes a single-phase coil, a plurality of polyphase coils each of which is shorter than the single-phase coil and wound to be parallel to the single-phase coil, a first permanent magnet movable relative to the single-phase coil and the plurality of polyphase coils in an axial direc ...


10
Nobushige Korenaga: Stage device and exposure apparatus using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 23, 2001: US06177978 (23 worldwide citation)

A scanning exposure apparatus having a stage device. The apparatus includes a reticle stage for moving a reticle having a pattern, a wafer stage for moving a wafer in a timed relation with the movement of the reticle stage and an optical system for projecting the pattern of the reticle onto the wafe ...