1
Nishi Kenji, Ota Kazuya & 039: Aligner and method for exposure. Nippon Kogaku, October 20, 1999: EP0951054-A1 (38 worldwide citation)

Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projection optical system PL. The wafer exchange and alignment are performed on the stage WS1, during which wafer W2 is e ...


2
Nishi Kenji, Suzuki Kazuaki: Scanning exposure apparatus.. Nippon Kogaku, January 11, 1995: EP0633506-A1 (15 worldwide citation)

In a projection exposure apparatus for transferring a pattern formed in a transfer area on a mask (12) onto a photosensitive substrate by a scanning exposure system, there is an illuminating optical system for illuminating the transfer area of the mask through a rectangular aperture (44a) in a field ...


3
Nishi Kenji: Projection exposure method and apparatus. Nippon Kogaku, July 29, 1998: EP0855623-A2 (11 worldwide citation)

A first pattern is illuminated in a first exposure step with a light beam which is inclined by a predetermined amount in a direction perpendicular to a line direction of a first L/S pattern with respect to an optical axis of a projection optical system (PL). The illumination in this manner causes tw ...


4
Nishi Kenji Virunubu Hodogaya: Method of exposing and apparatus therefor.. Nippon Kogaku, August 31, 1994: EP0613051-A1 (11 worldwide citation)

There is disclosed an exposure method for transferring, using an optical system for illuminating a mask (12) having patterns to be copied onto a substrate (5) and a projection optical system (8) for projecting images of the patterns to the substrate through the projection optical system by means of ...


5
Nishi Kenji: Exposure apparatus. Nippon Kogaku, April 1, 1998: EP0833193-A2 (9 worldwide citation)

An exposure apparatus with detachable illumination sensor, which is used to calibrate permanently installed illumination sensors such as an integrator sensor that detects the intensity of exposing light IL split by a beam splitter inside the illumination system and a fixed-type illumination sensor 7 ...


6
Nishi Kenji: Exposure method and apparatus. Nippon Kogaku, December 10, 1997: EP0811881-A2 (8 worldwide citation)

An projection exposure apparatus and method for illuminating a transfer pattern and forming an image upon a mask (R) for exposure from the illumination light (IL) and transfer exposing the image of the pattern of the mask (R) under the illumination light (IL). Switching is performed between a normal ...


7
Nishi Kenji, Kiuchi Toru: Stage apparatus and method for producing circuit device utilizing the same. Nippon Kogaku, September 30, 1998: EP0867773-A2 (5 worldwide citation)

The stage apparatus can improve static and dynamic features by reducing the number of electrical wiring or tubes for air pressure disposed in a movable main stage member of a movable stage apparatus. The movable stage apparatus has a base structure body and a movable stage structure body. When the m ...


8
Nishi Kenji: Exposure method and apparatus and method for producing exposure apparatus. Nippon Kogaku, August 8, 2001: EP1122609-A2 (5 worldwide citation)

In order to produce an exposure apparatus, a frame mechanism is assembled with a base plate, a column, and a support plate. After that, a sub-chamber provided with an illumination system is installed, and a projection optical system PL is placed on the support plate. Concurrently with this operation ...


9
Nishi Kenji: Image display unit and projection optical system. Nishi Kenji, June 22, 2005: EP1544666-A1 (5 worldwide citation)

An intermediate image of an image from the LCD module 142 is deflected by reflection mirrors M1 and M2 via zoom automatic focus control system (g) and then is formed on diffusion glass 131 via relay lens (b) and reflection mirrors M3 and M4. The LCD image is projected on the retina of eyeballs via e ...


10
Nishi Kenji: Exposure method and exposure apparatus. Nippon Kogaku, November 14, 2001: EP1154330-A2 (4 worldwide citation)

An exposure apparatus transfers an image of a pattern on a reticle (R) onto a wafer (W) by synchronously scanning the reticle and the wafer with respect to a projection optical system (PL) in a state in which the reticle is illuminated with an exposure light beam from an exposure light source (1) su ...