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Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 4, 2011: US07864292 (25 worldwide citation)

An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce t ...


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Michel Riepen, Nicolaas Rudolf Kemper: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 1, 2013: US08547523 (17 worldwide citation)

A fluid handling structure has a plurality of openings acting as a meniscus pinning system operating on the gas drag principle and a gas knife outwardly of the meniscus pinning system to break-up any film of liquid left behind. The separation between the gas knife and the meniscus pinning system is ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 28, 2010: US07804577 (12 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...


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Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens, Johannes Petrus Maria Smeulers: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 2, 2010: US07656501 (10 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus ...


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Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Joost Jeroen Ottens, Edwin Cornelis Kadijk, Sergei Shulepov: Lithographic apparatus and device manufacturing method. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, September 27, 2011: US08027019 (10 worldwide citation)

Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of ga ...


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Jozef Petrus Henricus Benschop, Hans Butler, Nicolaas Rudolf Kemper, Bartholomeus Hendricus Koek, Frits Van Der Meulen, Harmen Klaas Van Der Schoot: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 20, 2010: US07760324 (10 worldwide citation)

An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame whi ...


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Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411654 (9 worldwide citation)

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr ...


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Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 6, 2010: US07751027 (9 worldwide citation)

Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation ...