1
Naoto Sano, Masato Aketagawa, Hitoshi Nakano, Takahisa Shiozawa: Exposure method and apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 9, 1992: US05121160 (53 worldwide citation)

An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any ...


2
Naoto Sano, Tsutomu Asahina: Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 5, 1993: US05250797 (36 worldwide citation)

A semiconductor device manufacturing exposure method usable with a pulsed light source is disclosed. The light source is caused to produce pulses of light in accordance with successively changed control parameters, while a sensor detects each pulse of light from the light source. Outputs of the sens ...


3
Hidetoshi Nishigori, Naoto Sano: Exposure apparatus and device manufacturing method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 8, 1998: US05846678 (28 worldwide citation)

An exposure apparatus for transferring, by exposure, a pattern of a mask onto a wafer, includes a pulse light source and a scanning system for relatively and scanningly moving the mask and the wafer relative to an illumination region to be defined by pulses of light to be sequentially provided by th ...


4
Tsutomu Asahina, Naoto Sano: Light quantity measuring system and exposure apparatus using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 7, 1999: US05949468 (16 worldwide citation)

A light quantity measuring system and an exposure apparatus using the same, wherein the measuring system includes a light intensity measuring device having a plurality of light receiving elements arrayed at least along a scan direction, a scanning mechanism for scanningly moving the light intensity ...


5
Tadahiro Ohmi, Naoto Sano, Yasuyuki Shirai: Discharge electrode, shape-restoration thereof, excimer laser oscillator, and stepper. Tadahiro Ohmi, Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, July 13, 1999: US05923693 (14 worldwide citation)

A discharge electrode for an excimer laser oscillator according to the present invention contains oxygen at a content of not more than 10 ppm, and a method of restoring the shape of a discharge electrode according to the present invention comprises introducing an inert gas into a laser chamber, and ...


6
Naoto Sano: Exposure apparatus with a pulsed laser. Canon Kabushiki Kaishia, Fitzpatrick Cella Harper & Scinto, February 19, 2002: US06348357 (11 worldwide citation)

A semiconductor device manufacturing method includes the steps of providing a projection exposure apparatus, exposing a wafer by using the projection exposure apparatus, the exposing step including projecting a circuit pattern onto the wafer through the projection optical system using light from a f ...


7
Naoto Sano: Scanning exposure apparatus and method including controlling irradiation timing of an irradiation beam with respect to relative movement between the beam and a substrate. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 22, 1996: US05567928 (8 worldwide citation)

A scanning type exposure apparatus includes an irradiation source for irradiating an irradiation beam, which has an intensity fluctuation upon a start of irradiation; a scanner for imparting relative movement between the irradiation beam and a mask and a substrate to be exposed to a pattern of the m ...


8
Tadahiro Ohmi, Yasuyuki Shirai, Naoto Sano: Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface. Canon Kabushiki Kaisha, Tadahiro Ohmi, Fitzpatrick Cella Harper & Scinto, April 10, 2001: US06215806 (7 worldwide citation)

An excimer laser generating system includes a laser chamber whose inner surface is covered with a fluorine-passivated surface. Preferably, the surfaces of a blower and heat exchanger disposed in the laser chamber are also covered with a fluorine-passivated surface. The fluorine-passivated surface ma ...


9
Masato Aketagawa, Naoto Sano: Exposure method and apparatus and device produced thereby in which a stop includes an opening which is variable to substantially compensate for a change in bandwidth of a laser beam. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 26, 1997: US05661547 (7 worldwide citation)

An exposure apparatus includes a supplying device for supplying a band-narrowed laser beam, an optical system for directing the laser beam to a substrate, a detecting device for detecting a change in bandwidth of the laser beam and a stop provided on a path of the laser beam, the stop including an o ...


10
Naoto Sano, Yasuyuki Morishima: Module part and electronic device. Murata Manufacturing, Keating & Bennett, September 23, 2003: US06625031 (7 worldwide citation)

A part having a large height contained in a module part is placed in a first cut-off portion formed in a part-mounting substrate to be mounted. Moreover, the module part itself is placed in a second cut-off portion formed in a mother board to be mounted.