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Naomasa Shiraishi: Position-detection method and apparatus with a grating mark. Nikon Corporation, Klarquist Sparkman Campbell Leigh & Whinston, September 1, 1998: US05801390 (119 worldwide citation)

Methods and apparatus are disclosed for performing detection of the position of a substrate, such as used in photolithography, with high precision by zero Nth-order detection. Alignment marks (grating marks) on the substrate are illuminated by coherent light beams comprising multiple wavelength comp ...


2
Naomasa Shiraishi: Projection exposure apparatus. Nikon Corporation, Armstrong Westerman Hattori McLeland & Naughton, March 11, 1997: US05610684 (90 worldwide citation)

A projection exposure apparatus having an illuminating optical system for irradiating a mask having a pattern with illuminating light for exposure, and a projection optical system which is composed of a plurality of optical elements and arranged to take in light emanating from the pattern of the mas ...


3
Tetsuo Taniguchi, Naomasa Shiraishi: Projection exposure apparatus. Nikon Corporation, Armstong Westerman Hattori McLeland & Naughton, October 14, 1997: US05677757 (89 worldwide citation)

A projection exposure apparatus having an illuminating system for irradiating a mask, which has a pattern, with illuminating light for exposure, and a projection optical system for projecting an image of the mask pattern onto a photosensitive substrate with predetermined image-forming characteristic ...


4
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, June 11, 2002: US06404482 (89 worldwide citation)

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming be ...


5
Naomasa Shiraishi, Tetsuo Taniguchi, Hidemi Kawai: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, May 26, 1992: US05117255 (87 worldwide citation)

An exposure apparatus for exposing on a substrate a pattern formed on a mask, comprises a projection optical system for forming the pattern on a predetermined focusing plane and projecting an image of the pattern on the substrate located to be substantially aligned with the focusing plane, driving m ...


6
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Oliff & Berridge, April 3, 2001: US06211944 (84 worldwide citation)

A projection exposure apparatus and method that includes an illumination system and a projection system. The illumination system may include a plurality of optical integrators that form different secondary light sources. The illumination system illuminates the pattern with light from a secondary lig ...


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Naomasa Shiraishi: Exposure apparatus and exposure method, and device manufacturing method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, January 11, 2005: US06842221 (83 worldwide citation)

After a mask is carried into a reserve room for temporarily storing before carrying into a mask room filled with specific gas that has an impurity concentration lower than a first concentration (e.g. 1 ppb) and that has a characteristic of absorbing little exposure light, gas-replacement mechanisms ...


8
Tetsuo Taniguchi, Nobutaka Magome, Naomasa Shiraishi: Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure. Nikon Corporation, Vorys Sater Seymour and Pease, June 20, 2000: US06078380 (73 worldwide citation)

In a projection exposure apparatus and method, the intensity distribution of illumination light for detecting an imaging characteristic of a projection optical system is set substantially equal to the intensity distribution of exposure illumination light. The intensity distribution of a secondary li ...


9
Kenji Nishi, Saburo Kamiya, Naomasa Shiraishi: Projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, December 21, 1993: US05272501 (72 worldwide citation)

A projection exposure apparatus having an irradiation optical system for irradiating a pattern formed on a mask with first irradiation light, a projection optical system for imaging and projecting the image of the pattern of the mask onto a photosensitive substrate, and a mark detection device for i ...


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