1
Tetsuo Koyanagi, Hiroshi Yamaguchi, Ichio Yokota, Naofumi Mitsumune, Koichi Tange: Treatment method of semiconductor wafers and the like and treatment system for the same. Ses, Darby & Darby, September 14, 1999: US05951779 (38 worldwide citation)

A treatment method of semiconductor wafers and the like, for carrying out step by step in a sealed container, a series of processes comprising chemical process with a cleaning chemical (chemical process) and final water rinsing process by using rinsing pure water (rinse process) and a drying process ...


2
Tetsuo Koyanagi, Hiroshi Yamaguchi, Ichio Yokota, Naofumi Mitsumune, Koichi Tange: Treatment method of semiconductor wafers and the like and treatment system for the same. Ses, Darby & Darby, February 24, 2004: US06695926 (5 worldwide citation)

A method of treating semiconductor wafers in a sealed container is provided and includes transferring and vertically placing a plurality of wafers in the container and sealing the container. An inert gas is fed into the sealed container and a quantity of warm pure water is fed into the sealed contai ...