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Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure device and device manufacturing method. Nikon Corporation, Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi, KAWAKITA Kijuro, December 2, 2004: WO/2004/105107 (257 worldwide citation)

(EN) There is provided an exposure device capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and liquid. The exposure device projects a pattern image onto the substrate (P) v ...


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Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi: Exposure device and device manufacturing method. Nippon Kogaku, February 22, 2006: EP1628329-A1 (115 worldwide citation)

There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the subst ...


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Kobayashi Naoyuki, Tanimoto Shoichi, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Yamato Soichi: Exposure device and device manufacturing method. Nikon, October 6, 2005: JP2005-277363 (66 worldwide citation)

PROBLEM TO BE SOLVED: To provide an exposure device which can form a desired device pattern on a substrate by removing an unnecessary liquid, when exposing a pattern on the substrate via a projection optical system and the liquid.SOLUTION: The exposure device exposes the substrate by projecting an i ...


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Nakano Katsushi: (Ja) 露光方法、デバイス製造方法、及び基板, (En) Exposure method, device manufacturing method, and substrate. Nikon Corporation, Nakano Katsushi, SHIGA Masatake, May 18, 2006: WO/2006/051909 (65 worldwide citation)

(EN) There is provided an exposure method capable of preferably performing exposure while maintaining a liquid at a desired state. According to the exposure method, the liquid (LQ) is arranged on a substrate (P) and an exposure light is applied onto the substrate (P) via the liquid (LQ). The concent ...


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Nakano Katsushi, Hagiwara Tsuneyuki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device manufacturing method. Nikon Corporation, Nakano Katsushi, Hagiwara Tsuneyuki, SHIGA Masatake, February 23, 2006: WO/2006/019124 (60 worldwide citation)

(EN) An exposure apparatus capable of preventing a liquid from remaining on a measurement part and a device manufacturing method. The apparatus comprises a measurement system (60) having a first pattern (61) formed on the upper surface of a substrate stage and a second area (S2) specified near a fir ...


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Nakano Katsushi, Morimoto Shigeru, Kageyama Shigeki: (Ja) リニアモータ、ステージ装置、及び露光装置, (En) Linear motor, stage apparatus, and exposure apparatus. Nikon Corporation, Nakano Katsushi, Morimoto Shigeru, Kageyama Shigeki, SHIGA Masatake, July 27, 2006: WO/2006/077958 (60 worldwide citation)

(EN) Disclosed is a linear motor comprising a coil body (62) and a yoke (71) which moves relative to the coil body (62) while supporting an electric field generator (72). The yoke (71) has a first portion (73) which is made of a magnetic material and arranged basing on the saturated state of magneti ...


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Nakano Katsushi: (Ja) 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法, (En) Exposure method and apparatus, maintenance method and device manufacturing method. Nikon Corporation, Nakano Katsushi, KAWAKITA Kijuro, November 29, 2007: WO/2007/135990 (28 worldwide citation)

(EN) In an exposure method, a substrate (P) is held by a substrate holder (PH) on a substrate stage (PST), which moves on an image plane side of a projection optical system (PL), an immersion area (AR2) is formed on the image plane side of the projection optical system (PL) by using a liquid (1) sup ...


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Nakano Katsushi: Aligner and method for manufacturing device. Nikon, July 7, 2005: JP2005-183744 (22 worldwide citation)

PROBLEM TO BE SOLVED: To provide an aligner provided with a detection device capable of finding out a distance between a projecting optical system and a substrate at high accuracy even when space between the projecting optical system and the substrate is filled with liquid, and to provide a device m ...


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Nagahashi Yoshitomo, Nakano Katsushi: (Ja) 露光装置及び露光方法、メンテナンス方法、並びにデバイス製造方法, (En) Exposure apparatus, exposure method, maintenance method and device manufacturing method. Nikon Corporation, Nagahashi Yoshitomo, Nakano Katsushi, SHIGA Masatake, December 28, 2006: WO/2006/137410 (15 worldwide citation)

(EN) An exposure apparatus (EX) is provided with a supply port (8) for supplying a light path space (K) for exposure light (EL) with a liquid (2), and a liquid supply system (10) for supplying the supply port (8) with ionized liquids (2A, 2B).(JA)  露光装置(EX)は、露光光(EL)の光路空間(K)に液体(2)を供給する供給口(8)と、イオン化された ...