1
Masami Ohtani, Minobu Matsunaga, Tutomu Ueyama, Ryuji Kitakado, Kaoru Aoki, Masao Tsuji: Substrate processing apparatus. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, October 5, 1999: US05963753 (62 worldwide citation)

A substrate processing apparatus comprises a first substrate transfer unit having a first transfer path and a second substrate transfer unit having a second transfer path. A spin coating unit and a spin developing unit are arranged along the first transfer path, and a substrate cassette is arranged ...


2
Minobu Matsunaga, Yasuhiro Mizohata: Substrate cooling device and substrate heat-treating apparatus. Dainippon Screen Mfg Corp of Japan, Ostrolenk Faber Gerb & Soffen, May 2, 1995: US05411076 (46 worldwide citation)

A treating chamber includes a cooling plate assembly for supporting and cooling a substrate and an auxiliary cooling plate disposed on or adjacent a ceiling of the treating chamber. The auxiliary cooling plate reduces an atmospheric temperature in a space above the substrate supported on the cooling ...


3
Kazuhito Shigemori, Masakazu Sanada, Minobu Matsunaga, Katsushi Yoshioka, Kenji Sugimoto, Kaoru Aoki, Moritaka Yano, Satoshi Yamamoto, Tsuyoshi Mitsuhashi, Takashi Nagao, Mitsumasa Kodama, Yukihiko Inagaki, Yoshihisa Yamada: Substrate processing apparatus. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, May 6, 2003: US06558053 (33 worldwide citation)

A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the subst ...


4
Masami Ohtani, Minobu Matsunaga, Tutomu Ueyama, Ryuji Kitakado, Kaoru Aoki: Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, August 8, 2000: US06099643 (32 worldwide citation)

An atmospheric conditioning unit for supplying temperature- and humidity-controlled air to a chemical processing part (spin coater) is arranged immediately above a chemical processing part, between this chemical processing part and a heat treatment part (including a hot plate and a cool plate). Name ...


5
Akihiro Hisai, Minobu Matsunaga, Hiroshi Kobayashi: Processing system hot plate construction substrate. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, July 27, 1999: US05927077 (29 worldwide citation)

In a substrate thermal processing device, a temperature of a substrate can be precisely controlled within a short time by means of a hot plate oven. The substrate thermal processing device includes a substrate supporting plate for supporting the substrate, an auxiliary heating/cooling section for he ...


6
Kenji Sugimoto, Minobu Matsunaga, Masakazu Sanada, Katsushi Yoshioka, Kaoru Aoki, Moritaka Yano, Satoshi Yamamoto, Tsuyoshi Mitsuhashi, Takashi Nagao, Mitsumasa Kodama: Substrate treating apparatus and method. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, December 21, 2004: US06832863 (28 worldwide citation)

A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. Substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The paths include a going-only path for transporting the ...


7
Minobu Matsunaga, Masao Tsuji: Substrate cooling apparatus. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, June 4, 1996: US05522215 (24 worldwide citation)

A substrate cooling apparatus is provided with a cooling plate disposed in a treating chamber and Peltier elements for supporting and cooling a substrate. A target temperature setter is operable to set a target temperature to which the substrate is to be cooled and a drive device drives the Peltier ...


8
Yasuhiro Mizohata, Minobu Matsunaga: Substrate cooling method and apparatus. Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, June 17, 1997: US05638687 (23 worldwide citation)

In a substrate cooling apparatus for cooling a substrate placed on or adjacent a cooling plate having Peltier elements, the substrate is cooled quickly by controlling the Peltier elements to cool the cooling plate to a second set temperature below a target temperature to which the substrate is to be ...


9
Hiroyasu Goto, Akihiro Hisai, Minobu Matsunaga, Hiroshi Kobayashi: Apparatus for and method of thermally processing substrate. SMC Corporation, Dainippon Screen MFG, Ostrolenk Faber Gerb & Soffen, June 27, 2000: US06080969 (21 worldwide citation)

A substrate thermal processing apparatus easily changes a set temperature at which a substrate is set while thermally processed. A heating plate of the substrate thermal processing apparatus comprises a substrate supporting plate which supports a substrate, an auxiliary heating portion and a main he ...


10
Masakazu Sanada, Kayoko Nakano, Shigehiro Goto, Minobu Matsunaga: Coating solution applying method and apparatus. Dainippon Screen MFG, Arent Fox Kintner Plotkin & Kahn, August 27, 2002: US06440218 (19 worldwide citation)

An apparatus for applying a coating solution to a surface of a substrate to form a coating film of desired thickness thereon. The apparatus includes a rotary supporting device for supporting and spinning the substrate in horizontal posture, a solvent spraying device for spraying a solvent to the sub ...