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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 14, 2012: US08115903

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 1, 2014: US08687168

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M Mertens, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 14, 2014: US08860924

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead ...


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Cornelius Maria Rops, Nicolaas Rudolf Kemper, Michel Riepen: Lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 10, 2018: US10018921

An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in imme ...


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Cornelius Maria Rops, Nicolaas Rudolf Kemper, Michel Riepen: Lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, August 29, 2017: US09746782

An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in imme ...


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Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp: Fluid handling structure, a lithographic apparatus and a device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, May 15, 2018: US09971255

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


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Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops: Fluid handling structure, a lithographic apparatus and a device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 20, 2018: US10133190

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward d ...


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Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici: Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 10, 2018: US10018925

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.