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Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, December 19, 2017: US09846372

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...


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Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaƫl Christiaan Van Der Wekken: Lithographic apparatus and a method of operating the apparatus. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, November 3, 2015: US09176393

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii ...


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Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, February 9, 2016: US09256136

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a fir ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, October 25, 2016: US09477153

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 14, 2015: US09081300

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, September 29, 2015: US09146478

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, January 5, 2016: US09229335

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 17, 2018: US10025196

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.