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Michel Riepen, Nicolaas Rudolf Kemper: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 1, 2013: US08547523 (17 worldwide citation)

A fluid handling structure has a plurality of openings acting as a meniscus pinning system operating on the gas drag principle and a gas knife outwardly of the meniscus pinning system to break-up any film of liquid left behind. The separation between the gas knife and the meniscus pinning system is ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 28, 2010: US07804577 (12 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 7, 2008: US07433016 (11 worldwide citation)

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.


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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2013: US08345218 (8 worldwide citation)

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Catharinus Hubertus Mulkens, Rogier Hendrikus Magdalena Cortie, Ralph Joseph Meijers, Fabrizio Evangelista: Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 24, 2013: US08614784 (8 worldwide citation)

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, o ...


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Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 23, 2008: US07468779 (7 worldwide citation)

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Michel Riepen, Sergei Shulepov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 27, 2012: US08144305 (7 worldwide citation)

An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.


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Martinus Hendrikus Antonius Leenders, Michel Riepen, Martin Anton Bos: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 8, 2011: US07903232 (6 worldwide citation)

An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between tho ...