1
Michael R Vogtmann, Terry L Lentz: Accurate positioning of a wafer. Strasbaugh, Gray Cary Ware & Freidenrich, October 17, 2000: US06131589 (14 worldwide citation)

A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load station never makes solid contact with the wafer, b ...


2
Michael R Vogtmann, Terry L Lentz: Lifting and rinsing a wafer. STRASBAUGH, Gray Cary Ware & Friedenrich, August 15, 2000: US06102057 (10 worldwide citation)

A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper end, within which a spool is disposed to slide vertically. In its lowest position the spool is spaced f ...


3
Michael R Vogtmann, Terry L Lentz: Sensing the presence of a wafer. Lam Research Corporation, Martine Penilla & Kim, July 31, 2001: US06267642 (9 worldwide citation)

In a machine for planarizing wafers, when a spindle carrier descends over the load station, it needs a way of determining whether it should descend to a first position suitable for depositing a wafer onto the load station or whether it should descend to a lower second position suitable for acquiring ...


4
Michael R Vogtmann, Terry L Lentz: Accurate positioning of a wafer. Lam Research Corporation, Martine & Penilla, June 18, 2002: US06405740 (5 worldwide citation)

A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load station never makes solid contact with the wafer, b ...


5
Michael R Vogtmann, Terry L Lentz: Lifting and rinsing a wafer. Lam Research Corporation, Martine & Penilla, January 14, 2003: US06505635 (5 worldwide citation)

A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper end, within which a spool is disposed to slide vertically. In its lowest position the spool is spaced f ...


6
Michael R Vogtmann, Terry L Lentz: Non-contacting support for a wafer. Lam Research Corporation, Martine & Penilla, September 4, 2001: US06283827 (4 worldwide citation)

In one type of planarizing machine, a wafer is maintained with its fragile processed side facing downward as the wafer is passed from a robot to a load station and from the load station to a spindle carrier, and then returned from the spindle carrier to the load station to the robot. These transfers ...


7
Michael R Vogtmann, Michael S Wisnieski: Mixing manifold for multiple inlet chemistry fluids. Wafer Solutions, William F Vobach, Townsend and Townsend and Crew, October 14, 2003: US06632012 (4 worldwide citation)

Exemplary methods, systems and apparatus are provided for accomplishing mixing of chemistries, such as those used in polishing materials used in semiconductor manufacturing. A manifold is provided that combines chemistries with a mixing element, for example, so that the stability of the chemical sol ...


8
Frederic Anthony Schraub, Michael R Vogtmann, Benjamin C Smedley: System and method for in situ monitoring of top wafer thickness in a stack of wafers. Strasbaugh, K David Crockett Esq, Crockett & Crockett PC, August 27, 2013: US08520222 (4 worldwide citation)

A system for holding non-contact wafer probes over the surface of a wafer which includes a system for flushing the surface of the probe during grinding.


9
Thomas A Walsh, Michael R Vogtmann: Systems and methods of wafer grinding. Strasbaugh, Fitch Even Tabin & Flannery, March 3, 2015: US08968052 (3 worldwide citation)

Systems and methods are provided for use in processing and/or grinding wafers or other work products. Some embodiments provide a grinding apparatus that comprise a base casting; a rotary indexer configured to rotate within the base casting; a work spindle secured with the rotary indexer; a work chuc ...


10
Michael R Vogtmann, Terry L Lentz: Sensing the presence of a wafer. Lam Research Corporation, Martine & Penilla, September 28, 2004: US06796881 (3 worldwide citation)

In a machine for planarizing wafers, when a spindle carrier descends over the load station, it needs a way of determining whether it should descend to a first position suitable for depositing a wafer onto the load station or whether it should descend to a lower second position suitable for acquiring ...