1
Mark Kroon, Michael Cornelis Van Beek, Peter Dirksen, Ralph Kurt, Cassandra May Owen: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 5, 2006: US07145641 (40 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also ...


2
Michael Cornelis Van Beek, Frank Jeroen Pieter Schuurmans, Levinus Pieter Bakker: Optical analysis system using multivariate optical elements. Koninklijke Philips Electronics, March 2, 2010: US07671973 (34 worldwide citation)

The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The ...


3
Frank Jeroen Pieter Schuurmans, Michael Cornelis Van Beek, Levinus Pieter Bakker, Wouter Harry Jacinth Rensen, Bernardus Hendrikus Wilhelmus Hendriks, Robert Frans Maria Hendriks, Thomas Steffen: Optical analysis system. Koninklijke Philiips Electronics, July 29, 2008: US07405825 (20 worldwide citation)

The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detectin ...


4
Michael Cornelis Van Beek, Levinus Pieter Bakker, Theodorus Hubertus Josephus Bisschops, Jeroen Jonkers, Mark Kroon, Robertus Adrianus Maria Wolters, Adrianus Johannes Henricus Maas: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2008: US07315346 (14 worldwide citation)

A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constr ...


5
Gerhardus Wilhelmus Lucassen, Wouter Harry Jacinth Rensen, Michael Cornelis Van Beek, Marjolein Van Der Voort, Bernardus Leonardus Gerardus Bakker: Probe head for spectroscopic analysis of a fluid. Koninklijke Philips Electronics, March 26, 2013: US08406835 (5 worldwide citation)

A spectroscopic system for determining a property of a fluid flowing through a volume of interest underneath the surface of the skin of a patient is described. The spectroscopic system comprises: a probe head having an objective for directing an excitation beam into the volume of interest and for co ...


6
Michael Cornelis Van Beek, Gerald Lucassen, Marjolein Van Der Voort, Wouter Harry Jacinth Rensen, Durk Jolmer De Vries: Autofocus mechanism for spectroscopic system. Koninklijke Philips Electronics, February 16, 2010: US07663748 (3 worldwide citation)

An autofocus mechanism for a spectroscopic system determines a time varying optical property of a volume of interest. The mechanism measures the fluctuations of the optical property of the volume of interest for determining the position of the volume of interest. The spectroscopic system focuses an ...


7
Michael Cornelis Van Beek, Peter Ferdinand Greve: Spectroscopic analysis apparatus and method with excitation system and focus monitoring system. Koninklijke Philips Electronics, September 1, 2009: US07583380 (3 worldwide citation)

The present invention relates to an analysis apparatus, in particular a spectroscopic analysis apparatus, for analyzing an object, such as blood of a patient, and a corresponding analysis method. To aim the confocal detection volume inside a blood vessel orthogonal polarized spectral imaging (OPSI) ...


8
Michael Cornelis Van Beek, Wouter Rensen, Gerald Lucassen, Marjolein Van Der Voort, Bernardus Leonardus Gerardus Bakker: Aberration correction for spectroscopic analysis. Koninklijke Philips Electronics, March 31, 2009: US07511812 (2 worldwide citation)

A spectroscopic system which determines a property of a biological structure in a volume of interest of a person includes a low cost objective lens for directing an excitation beam into a volume of interest and for collecting return radiation from the volume of interest. After detection of the retur ...


9
Michael Cornelis Van Beek, Coen Theodorus Hubertus Fransiscus Liedenbaum, Gerhardus Wilhelmus Lucassen, Wouter Harry Jacinth Rensen: Catheter head. Koninklijke Philips Electronics, February 3, 2009: US07486978 (2 worldwide citation)

The present invention relates to a catheter head comprising: means (104, 108; 306, 304; 320; 322; 326; 338) for directing of radiation to a blood detection volume (220; 310), means (104, 108; 306, 304; 320; 322; 326; 332, 334, 330; 338) for receiving of return radiation from the blood detection volu ...


10
Bernardus Leonardus Gerardus Bakker, Michael Cornelis Van Beek, GĂ©rald Lucassen, Marjolein Van Der Voort, Wouter Harry Jacinth Rensen: Alignment system for spectroscopic analysis. Koninklijke Philips Electronics, October 19, 2010: US07817268 (2 worldwide citation)

The present invention provides a spectroscopic system as well as a method of autonomous tuning of a spectroscopic system and a corresponding computer program product. By detecting the position of return radiation in a transverse plane of an aperture of a spectroscopic analysis unit, a control signal ...