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Jim Felton Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Artashes Amamchyan, Michael Brendan Power, Ronald L DiCarol Jr, James Edward Felton: Alkyl group VA metal compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, September 6, 2005: US06939983

A method of preparing Group VA organometal compounds in high yield and high purity by the reaction of a Grignard reagent with a Group VA metal halide in certain ethereal solvents is provided. A method of preparing Group VA organometal hydrides is also provided.


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power: Method of depositing a metal-containing film. Rohm and Haas Electronic Materials, S Matthew Cairns, August 19, 2008: US07413776 (10 worldwide citation)

A method of depositing a Group IV metal-containing film on a substrate by conveying one or more of certain Group IV organometallic compounds in a gaseous phase to a deposition reactor containing a substrate and decomposing the one or more Group IV organometallic compounds to form a film of a Group I ...


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Ronald L DiCarlo Jr: Trialkylindium preparation. Shipley Company L L C, S Matthew Cairns, August 3, 2004: US06770769 (5 worldwide citation)

Trialkylindium compounds are prepared by reacting indium trihalide with a trialkylaluminum compound in the presence of a fluoride salt, wherein the molar ratio of the indium trihalide to the fluoride salt is at least 1:4.5. Such trialkylindium compounds are particularly suitable for use in metalorga ...


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power: Organometallic compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, August 3, 2010: US07767840 (4 worldwide citation)

Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly usef ...


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Artashes Amamchyan, Ronald L DiCarlo Jr: Alkyl group VA metal compounds. Shipley Company L L C, S Matthew Cairns, October 18, 2005: US06956127 (1 worldwide citation)

Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3−n, where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an i ...


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Jim Felton
Deodatta Vinayak Shenai Khatkhate, Artashes Amamchyan, Michael Brendan Power, Ronald L Dicarlo, James Edward Felton: Alkyl group VA metal compounds. Rohm and Haas Electronic Materials, Edwards & Angell, February 10, 2005: US20050033073-A1

A method of preparing Group VA organometal compounds in high yield and high purity by the reaction of a Grignard reagent with a Group VA metal halide in certain ethereal solvents is provided. A method of preparing Group VA organometal hydrides is also provided.


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power: Organometallic compounds. Rohm and Haas Electronic Materials, S Matthew Cairns, Rohm and Haas Electronic Materials, June 18, 2009: US20090156852-A1

Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly usef ...


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Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Ronald L Dicarlo: Trialkylindium preparation. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 9, 2003: US20030191333-A1

Trialkylindium compounds are prepared by reacting indium trihalide with a trialkylaluminum compound in the presence of a fluoride salt, wherein the molar ratio of the indium trihalide to the fluoride salt is at least 1:4.5. Such trialkylindium compounds are particularly suitable for use in metalorga ...


9
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Artashes Amamchyan, Ronald L DiCarlo: Alkyl Group VA metal compounds. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, September 25, 2003: US20030181746-A1

Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3n , where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an i ...


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