1
Dan Maydan, Sasson Somekh, David N Wang, David Cheng, Masato Toshima, Isaac Harari, Peter D Hoppe: Multi-chamber integrated process system. Applied Materials, Philip A Dalton, August 28, 1990: US04951601 (723 worldwide citation)

An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuu ...


2
Dan Maydan, Sasson Somekh, David N Wang, David Cheng, Masato Toshima, Isaac Harari, Peter D Hoppe: Multichamber integrated process system. Applied Materials, Birgit E Morris, March 8, 1994: US05292393 (199 worldwide citation)

An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuu ...


3
Dan Maydan, Sasson Somekh, David Nin Kou Wang, David Cheng, Masato Toshima, Isaac Harari, Peter D Hoppe: Multiple chamber integrated process system. Applied Materials, Kenyon & Kenyon, March 16, 1999: US05882165 (175 worldwide citation)

An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuu ...


4
Masato Toshima: Vacuum chamber slit valve. Applied Materials, Flehr Hohbach Test Albritton & Herbert, November 22, 1988: US04785962 (95 worldwide citation)

A slit valve for sealing an access opening in a vacuum chamber. The slit valve body or door is pivotally mounted adjacent the opening and has a pair of cam blocks mounted at its opposite ends. Cam follower rollers are mounted on a swing arm for reversible pivotal door opening and closing movement ef ...


5
Masato Toshima: Wafer transfer system and method of using the same. Gamma Precision Technology, Lyon & Lyon, December 28, 1999: US06007675 (57 worldwide citation)

An apparatus and method are described for stripping the photoresist from a wafer while in a substantially parallel manner, another wafer is being transferred between a load lock chamber and a transfer chamber, where the processing occurs. Further, a system is described whereby two load lock chambers ...


6
Masato Toshima: Wafer transfer system and method of using the same. Gamma Precision Technology, Lyon & Lyon, May 4, 1999: US05900105 (37 worldwide citation)

A wafer transfer system is described for transferring a wafer while at substantially the same time another wafer is being processed. The wafer transfer system comprises, in one embodiment, a transfer chamber having a wafer transfer blade, a load lock chamber coupled to the transfer chamber, an atmos ...


7
Masato Toshima: Wafer transfer system and method of using the same. Gamma Precision Technology, Lyon & Lyon, August 31, 1999: US05944940 (33 worldwide citation)

A wafer transfer system is described for transferring a wafer while at substantially the same time another wafer is being processed. The wafer transfer system comprises, in one embodiment, a transfer chamber having a wafer transfer blade, a load lock chamber coupled to the transfer chamber, an atmos ...


8
Masato Toshima: Apparatus and method for cleaning semiconductor wafers. Gamma Precision Technology, Lyon & Lyon, November 14, 2000: US06146469 (21 worldwide citation)

The present invention relates to an apparatus and method for cleaning post-etch semiconductor wafers using ultra-pure dry steam.


9
Masato Toshima: Wafer transfer system. Gamma Precision Technology, Lyon & Lyon, May 1, 2001: US06224680 (15 worldwide citation)

A wafer transfer system is described for transferring a wafer while at substantially the same time another wafer is being processed. The wafer transfer system comprises, in one embodiment, a transfer chamber having a wafer transfer blade, a load lock chamber coupled to the transfer chamber, a robot ...


10
Masato Toshima, Jerry Wong: Hydrogen evolution analyzer. MTM Engineering, Hickman & Beyer, February 22, 1994: US05288645 (8 worldwide citation)

Method for determining temperature ranges at which a selected gas evolves from a specimen of a selected material, bulk or surface of a metal, semiconductor, or insulator, and the probable source of that gas in each such temperature range. A specimen is placed in an evacuated and baked-out tube, and ...