1
Masato Muraki, Masato Aketagawa, Takahisa Shiozawa: Illuminating device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 4, 1990: US04974919 (94 worldwide citation)

An illumination device includes a light source for supplying light, an optical system for forming plural light fluxes from the light supplied by the light source, a scanning system disposed to receive the light fluxes formed by the forming optical system and for scanning the light fluxes substantial ...


2
Naoto Sano, Masato Aketagawa, Hitoshi Nakano, Takahisa Shiozawa: Exposure method and apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 9, 1992: US05121160 (53 worldwide citation)

An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any ...


3
Masato Aketagawa: Exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 27, 1990: US04905041 (21 worldwide citation)

An exposure apparatus for exposing, to a pattern of a first object, a second object by use of light is disclosed. The apparatus includes a light source for supplying light having a predetermined wavelength, for exposing the second object to the pattern of the first object, a detecting device for det ...


4
Masato Aketagawa, Shinji Utamura: Exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 10, 1992: US05095190 (7 worldwide citation)

A projection exposure apparatus includes an illumination system for illuminating a mask pattern; a projection optical system for projecting the mask pattern being illuminated upon the surface of a wafer so as to expose the same to the mask pattern; a wavelength detecting device effective to detect t ...


5
Masato Aketagawa, Naoto Sano: Exposure method and apparatus and device produced thereby in which a stop includes an opening which is variable to substantially compensate for a change in bandwidth of a laser beam. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 26, 1997: US05661547 (7 worldwide citation)

An exposure apparatus includes a supplying device for supplying a band-narrowed laser beam, an optical system for directing the laser beam to a substrate, a detecting device for detecting a change in bandwidth of the laser beam and a stop provided on a path of the laser beam, the stop including an o ...


6
Masato Aketagawa: Projection exposure system. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 6, 1990: US04968868 (7 worldwide citation)

A projection exposure system is disclosed, which includes: a laser; a mask stage for supporting a photomask; a wafer stage for supporting a wafer; an illumination optical system effective to illuminate the photomask by use of a light from the laser; a projection optical system for projecting, upon t ...


7
Masato Aketagawa, Naoto Sano: Exposure method and apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 28, 1997: US05597670 (6 worldwide citation)

A method of exposing a photosensitive substrate with a band-narrowed laser beam from an excimer laser includes providing a stop having an opening in a path of the laser beam; adjusting a size of the opening of the stop to substantially compensate for a change in bandwidth of the laser beam; and expo ...