1
Masao Kosugi, Akiyoshi Suzuki, Hideki Ina, Kazuhito Outsuka, Shigeki Ogawa, Masao Totsuka, Fumio Sakai: Projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 21, 1989: US04814829 (99 worldwide citation)

A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the pro ...


2
Masao Kosugi, Toshikazu Matsushita, Shuichi Yabu, Masakatsu Ohta: Projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 22, 1988: US04786947 (63 worldwide citation)

A semiconductor device manufacturing projection exposure apparatus in which a pattern of a reticle is projected onto a semiconductor wafer through a projection optical system having a lens element and in which the reticle is irradiated with a light of a predetermined wavelength to thereby transfer t ...


3
Masao Kosugi, Kazuo Iizuka: Container for a sheet-like article. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 11, 1988: US04776462 (33 worldwide citation)

A container for a sheet-like article, comprising a tray member for substantially accommodating therein the article, the tray member having an opening, a cover member for substantially sealingly covering the opening of the tray member, supporting elements provided in the tray member for supporting th ...


4
Naoki Ayata, Mitsugu Yamamura, Bunei Hamasaki, Masao Kosugi, Kazuo Takahashi, Mitsuaki Seki: Alignment and exposure apparatus and method for manufacture of integrated circuits. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 26, 1990: US04937618 (31 worldwide citation)

An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using ...


5
Hideki Ina, Masao Kosugi, Akiyoshi Suzuki: Alignment and exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 3, 1992: US05160957 (29 worldwide citation)

A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device including a portion for forming a ...


6
Hiroshi Sato, Shuichi Yabu, Masao Kosugi: Transfer apparatus provided with an auto-focusing mechanism. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 26, 1985: US04506977 (25 worldwide citation)

A transfer apparatus comprises a projection device operable with a photomask having a semiconductor circuit pattern therein and includes a projection lens for projecting the image of the photomask to a photosensitive member sensitive to the image of the photomask projected by the projection lens. Th ...


7
Masao Kosugi, Akiyoshi Suzuki, Hideki Ina, Hitoshi Fukuda: Projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 11, 1992: US05137363 (24 worldwide citation)

A projection exposure apparatus for projecting a pattern formed on a first object such as a reticle upon a second object such as a semiconductor wafer by use of a projection lens system, is disclosed. In the apparatus, a light of a predetermined wavelength is used for the pattern projection, and a l ...


8
Naoki Ayata, Mitsugu Yamamura, Bunei Hamasaki, Masao Kosugi, Kazuo Takahashi, Mitsuaki Seki: Alignment and exposure apparatus and method for manufacture of integrated circuits. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 17, 1991: US05050111 (23 worldwide citation)

An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using ...


9
Masao Kosugi: Precision actuator. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 1, 1991: US05053670 (23 worldwide citation)

A precision actuator includes a housing; an ultrasonic motor disposed in the housing and having a ring-like rotor and a stator; an output shaft; a rotation-restraint rectilinear motion guide for coupling the output shaft to the housing, slidably in an axial direction but unrotatably relative to it; ...


10
Masao Kosugi: Step and repeat exposure apparatus having improved system for aligning. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, April 18, 1989: US04823012 (22 worldwide citation)

An alignment and exposure apparatus for aligning and exposing, in sequence, different shot areas of a semiconductor wafer with and to a pattern formed on a reticle is disclosed. The apparatus includes an alignment system having at least one objective optical system for detecting, at the same time, a ...