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Masatoshi Hotta, Masakazu Oka, Yoshio Furuse, Hitoshi Atobe, Shigehiro Chaen: Catalyst for decomposing nitrous oxide, process for producing the same and method for decomposing nitrous oxide. Showa Denko, Sughrue Mion PLLC, January 25, 2005: US06846471 (14 worldwide citation)

The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support h ...


2
Masatoshi Hotta, Masakazu Oka, Yoshio Furuse, Hitoshi Atobe, Shigehiro Chaen: Process for treating waste anesthetic gas. Showa Denko, Sughrue Mion PLLC, June 26, 2007: US07235222 (6 worldwide citation)

To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic g ...


3
Masatoshi Hotta, Masakazu Oka, Yoshio Furuse, Hitoshi Atobe, Shigehiro Chaen: Catalyst for decomposing nitrous oxide, process for producing the same and method for decomposing nitrous oxide. Sughrue Mion, Zinn Macpeak & Seas Pllc, May 2, 2002: US20020051742-A1 (1 worldwide citation)

The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support h ...


4
Masatoshi Hotta, Masakazu Oka, Yoshio Furuse, Hitoshi Atobe, Shigehiro Chaen: Process and apparatus for treating waste anesthetic gas. Showa Denko, Sughrue Mion PLLC, October 6, 2009: US07597858

To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide, discharged from an operating room. In the present invention, a waste anesthetic gas containing a volatile anesthetic and nitrous oxide is introduced into an adsorbing cylinde ...


5
Masakazu Oka, Tomoyuki Fukuyo, Junichi Torisu: Process for producing fluorine gas. Showa Denko, Sughrue Mion PLLC, August 11, 2009: US07572428

A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence ...


6
Masakazu Oka, Naoki Asaga, Tomoyuki Fukuyo: Process for producing manganese fluoride. Show A Denko, Sughrue Mion PLLC, April 28, 2009: US07524480

Disclosed is a process for producing manganese fluoride, comprising a step (1) of allowing a manganese compound such as MnF2 having been dried at a temperature of not lower than 100° C. to react with a fluorinating agent such as F2 at a temperature of 50 to 250° C. and a step (2) of further allowing ...


7
Hitoshi Atobe, Masakazu Oka, Toraichi Kaneko: Production of tetrafluorosilane. Showa Denko, Sughrue Mion PLLC, July 11, 2006: US07074377

Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisil ...


8
Hitoshi Atobe, Masakazu Oka, Toraichi Kaneko: Production and use of tetrafluorosilane. Sughrue Mion Pllc, September 23, 2004: US20040184980-A1

Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisil ...


9
Masakazu Oka: Method for producing tetrafluorosilane. Sughrue Mion Pllc, January 4, 2007: US20070003466-A1

The invention relates to a method for producing tetrafluorosilane by decomposing hexafluorosilicic acid with sulfuric acid, which comprises: step 1 of decomposing hexafluorosilicic acid in concentrated sulfuric acid in the first reactor to give SiF4 and HF and taking out the SiF4; step 2 of transfer ...


10
Masatoshi Hotta, Masakazu Oka, Yoshio Furuse, Hitoshi Atobe, Shigehiro Chaen: Process and apparatus for treating waste anesthetic gas. Sughrue Mion Pllc, October 2, 2003: US20030185735-A1

To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic g ...