1
Masahisa Kakinuma, Osamu Kawana, Katsuto Murata: Compositions and method for formation of barrier ribs of plasma display panel. Taiyo Ink Manufacturing, Rader Fishman & Grauer, November 24, 1998: US05840465 (29 worldwide citation)

A composition for the formation of barrier ribs of a plasma display panel and a method for the formation of the barrier ribs are disclosed. The formation of barrier ribs is effected by applying either a composition comprising (A) a low-melting glass having a working point of not more than 560.degree ...


2
Masahisa Kakinuma, Hideaki Kojima, Nobuyuki Yanagida: Photosensitive composition and calcined pattern obtained by use thereof. Taiyo Ink Manufacturing, Rader Fishman & Grauer PLLC, January 29, 2002: US06342322 (17 worldwide citation)

Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive compositio ...


3
Masahisa Kakinuma, Shigeru Komori, Kazuhiro Yoshida, Minoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara: Resist ink composition and cured article prepared therefrom. Nippon Kayaku Kabushiki Kaisha, Taiyo Ink Manufacturing, Nields & Lemack, July 23, 1996: US05538821 (10 worldwide citation)

The present invention relates to a resist ink composition characterized by comprising a specific unsaturated polycarboxylic acid resin (A) or a specific unsaturated polycarboxylic acid/urethane resin (A'), a photopolymerization initiator (B), a diluent (C), and a curing component (D) and a cured art ...


4
Masahisa Kakinuma, Nobuyuki Suzuki, Tsuyoshi Mitani: Photosensitive composition and calcined pattern obtained by use thereof. Taiyo Ink Manufacturing, Rader Fishman & Grauer, December 4, 2001: US06326125 (9 worldwide citation)

Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive compositio ...


5
Masahisa Kakinuma, Ooki Tomobe, Kouichi Takagi: Photosensitive composition and calcined pattern obtained by use thereof. Taiyo Ink Manufacturing, Ronald P Rader Fishman & Grauer Kananen, August 15, 2000: US06103452 (7 worldwide citation)

Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive compositio ...


6
Masahisa Kakinuma, Masatoshi Kusama, Shigeru Ushiki: Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof. Taiyo Ink Manufacturing, Oblon Spivak McClelland Maier & Neustadt P C, December 9, 2008: US07462653 (4 worldwide citation)

A photocurable and thermosetting composition for an ink jet system comprises (A) a monomer having a (meth)acryloyl group and a thermosetting functional group in its molecule, (B) a photoreactive diluent having a weight-average molecular weight of not more than 700 other than the component (A) mentio ...


7
Masahisa Kakinuma, Masatoshi Kusama, Shigeru Ushiki: Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof. Taiyo Ink Mfg, Oblon Spivak Mcclelland Maier & Neustadt PC, March 16, 2006: US20060058412-A1

A photocurable and thermosetting composition for an ink jet system comprises (A) a monomer having a (meth)acryloyl group and a thermosetting functional group in its molecule, (B) a photoreactive diluent having a weight-average molecular weight of not more than 700 other than the component (A) mentio ...