1
Hideaki Kobayashi, Masahiro Shindo: Knowledge based method and apparatus for designing integrated circuits using functional specifications. International Chip Corporation, Ricoh Company, Bell Seltzer Park & Gibson, May 1, 1990: US04922432 (166 worldwide citation)

The present invention provides a computer-aided design system and method for designing an application specific integrated circuit which enables a user to define functional architecture independent specifications for the integrated circuit and which translates the functional architecture independent ...


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Masahiro Shindo, Toshikazu Yoshimizu, Kenichi Kurihara, Shunpei Tamaki, Toshio Kawakami, Yukio Kadowaki, Shoji Matsumoto: IC chip mounting method. Ricoh Company, Cooper & Dunham, September 17, 1991: US05048179 (127 worldwide citation)

An IC mounting method and its resulting structure, such as an IC card is provided. An IC card includes a metal plate formed with at least one hole, and an IC chip is located fixed in position in the hole with a filler material filling the gap between the hole and the IC chip. An interconnect pattern ...


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Tai Sugimoto, Hideaki Kobayashi, Masahiro Shindo, Haruo Nakayama: Integrated silicon-software compiler. International Chip Corporation, Ricoh Company, Bell Seltzer Park & Gibson, March 23, 1993: US05197016 (104 worldwide citation)

A computer-aided system and method is disclosed for designing an application specific integrated circuit (ASIC) whose intended function is implemented both by a hardware subsystem including hardware elements on the integrated circuit and by a software subsystem including a general purpose microproce ...


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Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa: Semiconductor device and method of fabricating the same. Mega Chips Corporation, Oblon Spivak McClelland Maier & Neustadt P C, February 15, 2000: US06025252 (24 worldwide citation)

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom ...


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Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa: Field-effect thin-film transistor device. Mega Chips Corporation, Crystal Device Corporation, Oblon Spivak McClelland Maier & Neustadt P C, January 23, 2001: US06177706 (24 worldwide citation)

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (


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Mikio Kyomasu, Toshiyuki Araki, Shinobu Fukunaga, Masahiro Shindo: Erasable FPLA. Ricoh Company, Oblon Fisher Spivak McClelland & Maier, October 14, 1986: US04617649 (24 worldwide citation)

An erasable field programmable logic array including a matrix of reprogrammable memory elements which may be selectively programmed to store a desired logic function therein is provided. Since use is made of reprogrammable memory elements, the stored logic function may be erased and another logic fu ...


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Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa: Semiconductor device having a single crystal gate electrode and insulation. Mega Chips Corporation, Silicon Technology Corporation, Oblon Spivak McClelland Maier & Neustadt P C, May 1, 2001: US06225668 (16 worldwide citation)

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (


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Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa: Semiconductor device and method of fabricating the same. Mega Chips Corporation, Crystal Device Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 24, 2000: US06137120 (15 worldwide citation)

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (1104) of a single-crystalline Si substrate (1102) whose (100) plane is upwardly directed is irradiated with Ne atom ...


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Masahiro Shindo, Daisuke Kosaka, Tetsuo Hikawa, Akira Takata, Yukihiro Ukai, Takashi Sawada, Toshifumi Asakawa: Semiconductor device and method of fabricating the same. Mega Chips Corporation, Crystal Device Corporation, Oblon Spivak McClelland Maier & Neustadt P C, January 13, 2004: US06677214 (13 worldwide citation)

In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer (