1
Marvin Farley: Ion implantation surface charge control method and apparatus. Eaton Corporation, F M Sajovec, February 14, 1989: US04804837 (63 worldwide citation)

An ion beam neutralizer. High energy electrons are directed through an ion beam neutralizing zone or region containing an ionizable gas. As the high energy electrons collide with the gas molecules, they ionize the gas molecules and produce low energy electrons which are trapped by a positively charg ...


2
Marvin Farley: Dose control method. Eaton Corporation, C H Grace, F M Sajovec, September 3, 1985: US04539217 (62 worldwide citation)

A method and apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known rela ...


3

4
Theodore H Smick, Geoffrey Ryding, Marvin Farley: Method and apparatus for controlling a workpiece in a vacuum chamber. Orion Equipment, Burns Doane Swecker & Mathis L, April 27, 1999: US05898179 (39 worldwide citation)

An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differe ...


5
Theodore Smick, Geoffrey Ryding, Ronald F Horner, Paul Eide, Marvin Farley, Kan Ota: Low-inertia multi-axis multi-directional mechanically scanned ion implantation system. Axcelis Technologies, Eschweiler & Associates, July 24, 2012: US08227768 (37 worldwide citation)

An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The ...


6
Marvin Farley: Dose control apparatus. Eaton Corporation, C H Grace, F M Sajovec, May 6, 1986: US04587433 (36 worldwide citation)

An apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship a ...


7
Marvin Farley, Vadim G Dudnikov, Mehran Nasser Ghodsi: Ion implantation with charge neutralization. Ebara Corporation, August 7, 2001: US06271529 (35 worldwide citation)

An ion implanter is provided for implanting ions in a workpiece. The ion implanter includes an apparatus for generating an ion beam and directing it toward a surface of a work piece and a plasma generator for generating plasma to neutralize the ion beam and the work piece surface. The plasma generat ...


8
Theodore H Smick, Geoffrey Ryding, Marvin Farley: Method and apparatus for controlling a workpiece in a vacuum chamber. Applied Materials, Boult Wade Tennant, August 20, 2002: US06437351 (33 worldwide citation)

An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differe ...


9
Peter H Rose, Marvin Farley, Lee Grodzins: Treating work pieces with electro-magnetically scanned ion beams. Eaton Corporation, February 14, 1989: US04804852 (28 worldwide citation)

A magnetic scanning technique for sweeping an ion beam across an implantation target, such as a semiconductor wafer, by means of modulating the energy of a beam and directing it through an analyzer magnet, which effects a scanning motion of the beam of constant intensity, the wave form for the modul ...


10
Geoffrey Ryding, Theodore H Smick, Marvin Farley, Takao Sakase: Vacuum bearing structure and a method of supporting a movable member. Applied Materials, Boult Wade Tennant, February 4, 2003: US06515288 (26 worldwide citation)

A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an in ...