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Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Gert Jan Heerens, Robert Gabriƫl Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra: Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 9, 2008: US07423733 (1 worldwide citation)

The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries ...


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Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Christian Wagner, Rogier Hendrikus Magdalena Cortie: Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 10, 2015: US08953141 (1 worldwide citation)

A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an accel ...


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Martinus Hendrikus Antonius Leenders, Henrikus Herman Marie Cox, Leon Martin Levasier: Lithographic apparatus, projection system, method of projecting and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 30, 2007: US07170580 (1 worldwide citation)

A projection system includes at least one projection device configured to receive a beam of radiation coming from a first object and project the beam to a second object. The projection system further includes a sensor configured to measure a spatial orientation of the at least one projection device ...


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Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Michel Riepen, Sergei Shulepov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 20, 2011: US08023101 (1 worldwide citation)

An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.


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Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital aposevitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. Asml Netherlands, Pillsbury Winthrop, October 24, 2002: US20020154279-A1 (1 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


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Martinus Hendrikus Antonius Leenders, Den Boef Arie J, Burghoorn Jacobus, Mickan Uwe, Vanner Roeland Nicolaas Maria, Hauschild Jan: Method of performing tilted focus testing, exposure apparatus, and device manufactured accordingly. Asml Netherlands, August 10, 2006: JP2006-210895 (1 worldwide citation)

PROBLEM TO BE SOLVED: To provide a method of performing a tilted focus testing and an exposure apparatus, capable of easily giving a tilt to the projection beam with a pattern using a tilting device, and capable of easily performing tilted defocus testing, and to provide a device manufactured in acc ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, October 25, 2016: US09477153

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 14, 2015: US09081300

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.