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Hans Van Der Laan, Johannes Jacobus Matheus Baselmans, Antonius Johannes Josephus Van Dijsseldonk, Martinus Hendrikus Antonius Leenders, Johannes Hubertus Josephina Moors: Lithographic apparatus and a measurement system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 6, 2005: US06940587 (4 worldwide citation)

A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the r ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov, Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 16, 2013: US08421996 (3 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...


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Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M Mertens, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 21, 2012: US08248577 (3 worldwide citation)

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, September 22, 2015: US09140996 (2 worldwide citation)

An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce t ...


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Joost Jeroen Ottens, Johannes Henricus Wilhelmus Jacobs, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and substrate edge seal. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 23, 2011: US08003968 (2 worldwide citation)

A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from th ...


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Jan Evert Van Der Werf, Erik Roelof Loopstra, Hans Meiling, Johannes Hubertus Josephina Moors, Martinus Hendrikus Antonius Leenders: Device manufacturing method, device manufactured thereby and a mask for use in the method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 17, 2009: US07492443 (2 worldwide citation)

A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection s ...


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Maurice Wijckmans, Martinus Agnes Willem Cuijpers, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Theodorus Petrus Maria Cadee, Frederik Eduard De Jong, Wilhelmus Franciscus Johannes Simons, Edwin Augustinus Matheus Van Gompel, Martin Frans Pierre Smeets, Rob Jansen, Gerardus Adrianus Antonius Maria Kusters, Martijn Van Baren: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 16, 2014: US08913228 (2 worldwide citation)

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to co ...