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Joost Jeroen Ottens, Johannes Henricus Wilhelmus Jacobs, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and substrate edge seal. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 2, 2008: US07420194 (6 worldwide citation)

A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from th ...


22
Noud Jan Gilissen, Sjoerd Nicolaas Lambertus Donders, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and method of manufacturing a device. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 18, 2005: US06956222 (6 worldwide citation)

A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate ta ...


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Martinus Hendrikus Antonius Leenders, Michel Riepen, Martin Anton Bos: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 8, 2011: US07903232 (6 worldwide citation)

An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between tho ...


24
Lucas Henricus Johannes Stevens, Martinus Hendrikus Antonius Leenders, Hans Meiling, Johannes Hubertus Josephina Moors: Lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 22, 2006: US07095479 (6 worldwide citation)

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The app ...


25
Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 19, 2011: US07929112 (5 worldwide citation)

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...


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Wilhelmus Josephus Box, Antonius Johannes Josephus Van Dijsseldonk, Dominicus Jacobus Petrus Adrianus Franken, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Josephus Jacobus Smits, Marc Wilhelmus Maria Van Der Wijst: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07116399 (4 worldwide citation)

A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors a ...


28
Martin Lowisch, Marcel Mathijs Theodore Marie Dierichs, Koen Van Ingen Schenau, Hans Van Der Laan, Martinus Hendrikus Antonius Leenders, Elaine McCoo, Uwe Mickan: Device manufacturing method and computer program. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 9, 2006: US07042550 (4 worldwide citation)

System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.


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Bernardus Antonius Johannes Luttikhuis, Pertrus Rutgerus Bartray, Wilhelmus Josephus Box, Martinus Hendrikus Antonius Leenders, Marc Wilhelmus Maria Van Der Wijst: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 20, 2005: US06977713 (4 worldwide citation)

A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system t ...


30
Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 16, 2005: US06930760 (4 worldwide citation)

In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectr ...