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Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 4, 2011: US07864292 (25 worldwide citation)

An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce t ...


3
Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens: Lithographic apparatus and method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 22, 2013: US08564763 (19 worldwide citation)

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.


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Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411657 (18 worldwide citation)

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds th ...


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Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, August 24, 2004: US06781673 (17 worldwide citation)

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...


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Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 12, 2011: US07978306 (16 worldwide citation)

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds th ...


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Martinus Hendrikus Antonius Leenders, Johannes Hubertus Josephina Moors, Erik Roelof Loopstra, Noud Jan Gilissen, Markus Franciscus Antonius Eurlings: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, May 25, 2004: US06741329 (15 worldwide citation)

An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.


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Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, January 13, 2004: US06678037 (15 worldwide citation)

In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectr ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 28, 2010: US07804577 (12 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...