Martin Feldman, Lynn O Wilson: Inspection system utilizing dark-field illumination. AT&T Bell Laboratories, Eugen E Pacher, June 17, 1986: US04595289 (97 worldwide citation)

Integrated-circuit wafers and the lithographic masks and reticles used in their fabrication must be inspected for defects. Conventional systems accomplish such inspection by bright-field illumination and comparison of corresponding portions of two supposedly identical patterns on the workpiece. The ...

Martin Feldman, Alan D White, Donald L White: Method and apparatus for aligning mask and wafer members. Bell Telephone Laboratories Incorporated, Lucian C Canepa, April 27, 1982: US04326805 (83 worldwide citation)

Zone plate patterns (12,20,61,62) formed on spaced-apart mask and wafer members (10,60) are utilized for alignment purposes in the fabrication of integrated circuits. By providing off-axis illumination of the patterns, a significant mask-to-wafer alignment capability is provided in an X-ray lithogra ...

Martin Feldman, Alan David White: Zone plate alignment marks. Bell Telephone Laboratories Incorporated, Lucian C Canepa, July 26, 1977: US04037969 (82 worldwide citation)

Certain classes of patterns, for example so-called zone plates, are utilized as alignment marks in the fabrication of integrated circuits. Such a plate, which functions as a lens, provides a high-brightness image that is relatively insensitive to any degradation of the pattern.

Martin Feldman: Scanning systems for high resolution e-beam and X-ray lithography. Board of Supervisors of Louisiana State University and Agricultural and Mechanical College, John H Runnels, June 13, 1995: US05424549 (59 worldwide citation)

An electron-beam lithography apparatus and method, including an electron source with a mask or photocathode for generating a patterned electron beam; an electron-sensitive resist layer; a conductive plate with a slit, located between the electron source and the resist layer, with the patterned elect ...

Jacob Appelbaum, Martin Feldman: Proximity printing method. Bell Telephone Laboratories Incorporated, Roderick B Anderson, Lucian C Canepa, May 31, 1977: US04026653 (54 worldwide citation)

A predetermined small spacing or gap between a semiconductor wafer and a mask is defined by projecting a cushion of air through a central mask aperture toward the wafer. The wafer is supported on a sponge rubber member which is designed, along with the air flow paths, to maintain a uniform small sep ...

Martin Feldman: Wafer chuck comprising a curved reference surface. American Telephone and Telegraph Company AT&T Bell Laboratories, Lucian C Canepa, February 9, 1988: US04724222 (52 worldwide citation)

A chuck for holding a workpiece (e.g., a semiconductor wafer) in a vacuum comprises a curved reference surface. By clamping the edges of the workpiece and maintaining its backside against the curved surface (or against pins mounted on the surface), the frontside of the workpiece can be thereby estab ...

Martin Feldman, Donald Lawrence White: Inspection of masks and wafers by image dissection. Bell Telephone Laboratories Incorporated, L C Canepa, June 15, 1976: US03963354 (30 worldwide citation)

In an automated inspection procedure, corresponding elements from all the patterns lying along a row of a replicated-pattern mask or wafer are successively imaged onto a storage medium in an interleaved way. At the completion of an inspection cycle, sets of corresponding elements from all the patter ...

Martin Feldman, Alan D White, Donald L White: Wafer tilt compensation in zone plate alignment system. Bell Telephone Laboratories Incorporated, Lucian C Canepa, Arthur J Torsiglieri, August 16, 1983: US04398824 (25 worldwide citation)

The present invention is a method and apparatus for aligning a semiconductor wafer to be patterned by a step-and-repeat photolithographic system. The inventive alignment technique, which is able to compensate for local wafer tilt and/or nonuniform photoresist thickness, is applicable to semiconducto ...

Martin Feldman, Martin P Lepselter: Charged-particle-beam lithography. American Telephone and Telegraph Company AT&T Bell Laboratories, Lucian C Canepa, May 3, 1988: US04742234 (24 worldwide citation)

An elongated source of charged particles is utilized in a lithographic system to form multiple focused electron (or ion) beams arranged in a linear array. The basis for an extremely high-throughput lithographic system especially suited for direct writing applications is thereby provided.

Martin Feldman: Two-dimensional imaging with line arrays. AT&T Bell Laboratories, Lucian C Canepa, January 13, 1987: US04636080 (19 worldwide citation)

One or two linear arrays of photodetectors are combined with optical elements to form an arrangement capable of determining the X-Y location of a focused laser beam or other light spot. The resulting arrangement is characterized by low cost and by excellent resolution, stability and linearity. Moreo ...