1
Martinus Hendrikus Antonius Leenders, Michel Riepen, Martin Anton Bos: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 8, 2011: US07903232 (6 worldwide citation)

An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between tho ...


2
Johannes Wilhelmus Leonardus Boumans, Ricardo Marinus Albertus Nagtegaal, Albertus Dunnewind, Randolph Peter Happe, Martin Anton Bos, Merete Faergemand, Peter Degn: Method For Enzmatic Cross-Linking Of A Protein, Cross-Linked Protein Thus Obatained And Use Thereof. Weingarten Schurgin Gagnebin & Lebovici, October 2, 2008: US20080241878-A1

The present invention provides methods for enzymatic cross-linking of a protein comprising performing a reaction for enzymatic cross-linking of said protein in the presence of a phenolic saccharide, wherein said reaction comprises the step of forming protein-protein cross-links. The present inventio ...


3
Martinus Hendrikus Antonius Leenders, Michel Riepen, Martin Anton Bos: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, Eric S Cherry Docketing Supervisor, October 18, 2007: US20070243697-A1

An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between tho ...