1

2

3
Martijn Houkes, Henrikus Herman Marie Cox, Ramidin Izair Kamidin, Patricia Vreugdewater: Positioning system and positioning method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 28, 2006: US07005823 (5 worldwide citation)

A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a fu ...


4
Martijn Houkes, Hans Butler, Henrikus Herman Marie Cox: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 4, 2007: US07265813 (4 worldwide citation)

A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrat ...


5
Jan Gerard Cornelis Van Der Toorn, Hans Butler, Henrikus Herman Marie Cox, Evert Hendrik Jan Draaijer, Nicolaas Ten Kate, Frits Van Der Meulen, Mark Johannes Hermanus Frencken, Martijn Houkes, Antonius Henricus Arends, Minne Cuperus: Lithographic apparatus, immersion projection apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 12, 2008: US07330238 (3 worldwide citation)

A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens e ...


6
Frits Van Der Meulen, Henrikus Herman Marie Cox, Martijn Houkes, Robertus Johannes Van Vliet, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Roland Petrus Hendrikus Hanegraaf: Lithographic apparatus immersion damage control. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 30, 2007: US07170583 (3 worldwide citation)

A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to sup ...


7
Hans Butler, Jan Gerard Cornelis Van Der Toorn, Martijn Houkes, Wilhelmus Franciscus Johannes Simons: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 8, 2009: US07630059 (2 worldwide citation)

A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, th ...


8

9
Ramidin Izair Kamidi, Hans Butler, Martijn Houkes, Marinus Maria Johannes Van De Wal, Jeroen Johan Maarten Van De Wijdeven: Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, October 7, 2014: US08854607 (1 worldwide citation)

A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the center of gravity of the object into a sec ...


10
Evert Hendrik Jan Draaijer, Martinus Agnes Willem Cuijpers, Menno Fien, Marcus Joseph Elisabeth Godfried Breukers, Martijn Houkes, Edwin Teunis Van Donkelaar: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 12, 2006: US07148950 (1 worldwide citation)

A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of ...