1
David G Emery, Zain K Saidin, Mark J Wihl, Tao Yi Fu, Marek Zywno, Damon F Kvamme, Michael E Fein: Automated photomask inspection apparatus and method. KLA Instruments Corporation, Allston L Jones, October 8, 1996: US05563702 (227 worldwide citation)

A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive, opaque portions and at the transition regions of the opaque and transmissive portions of the substrate. A transmissive substrate is illumina ...


2
Donald L Danielson, Mark J Wihl, David A Joseph: Reticle inspection system. KLA Instruments Corporation, Rosenblum Parish & Bacigalupi, May 15, 1990: US04926489 (179 worldwide citation)

An automatic inspection system including an illuminator for illuminating a reticle or photomask to be inspected, while optically projecting a magnified image of the reticle or photomask onto a plurality of detector elements. A carriage assembly moves the object at a constant velocity to allow the de ...


3
Kenneth Levy, Steve Buchholz, William H Broadbent, Mark J Wihl: Photomask inspection apparatus and method with improved defect detection. KLA Instruments Corporation, Claude Hamrick, April 1, 1986: US04579455 (165 worldwide citation)

Apparatus 20 for inspecting photomasks 26 and the like by comparison of duplicate die patterns, including improved defect detection. Two-dimensional pixel representations of two die patterns are formed, with pixels having values or black or white or shades or grey, depending upon the features of the ...


4
Tim S Wihl, Mark J Wihl: Photomask inspection apparatus and method using corner comparator defect detection algorithm. KLA Instruments Corporation, Claude Hamrick, July 30, 1985: US04532650 (162 worldwide citation)

Defect detection apparatus including a mechanical and optical system for scanning duplicate areas of a photomask to be inspected, electronic means for converting the optically scanned information to digitized form, memory for storing such information, and means for comparing information obtained fro ...


5
Mark J Wihl, Tao Yi Fu, Marek Zywno, Damon F Kvamme, Michael E Fein: Automated photomask inspection apparatus. KLA Instruments Corporation, Claude Hamrick, November 5, 1996: US05572598 (154 worldwide citation)

An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining refe ...


6
William H Broadbent Jr, Steve Buchholz, Peter Eldredge, Mark J Wihl: Automatic system and method for inspecting hole quality. KLA Instruments Corporation, Claude Hamrick, November 26, 1985: US04555798 (124 worldwide citation)

An automatic inspection system for inspecting holes in a mask including carriage means 30, illumination means 44, optical means 48, photosensitive detector means 46, and signal processing means 56. The mask 34 to be inspected is positioned by the carriage means in a horizontal plane. The optical mea ...


7
David Garth Emery, Zain Kahuna Saidin, Mark J Wihl, Tao Yi Fu, Marek Zywno, Damon F Kvamme, Michael E Fein: Automated photomask inspection apparatus and method. KLA Instruments Corporation, Allston L Jones, April 7, 1998: US05737072 (120 worldwide citation)

A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive, opaque portions and at the transition regions of the opaque and transmissive portions of the substrate. A transmissive substrate is illumina ...


8
Mark J Wihl: Automatic photomask inspection system having image enhancement means. KLA Instruments Corporation, Hamrick Hoffman Guillot & Kazubowski, December 30, 1986: US04633504 (108 worldwide citation)

Optical inspection apparatus for detecting defects in a visually perceptible pattern including image acquistion means for inspecting the pattern on a pixel-by-pixel basis, developing digital data signals corresponding to each pixel and feeding the signals so developed to an imaging enhancement means ...


9
Mark J Wihl, Yalin Xiong, Lih Huah Yiin: Method for detecting lithographically significant defects on reticles. KLA Tencor Corporation, Suiter Swantz pc llo, January 18, 2011: US07873204 (27 worldwide citation)

A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are ...


10
Curt H Chadwick, Robert R Sholes, John D Greene, Francis D Tucker III, Michael E Fein, P C Jann, David J Harney, William Bell, Bin Ming B Isai, Walter I Novak, Mark J Wihl: Automatic high speed optical inspection system. Allston L Jones, February 4, 1992: US05085517 (26 worldwide citation)

In each configuration, at least one TDI sensor is used to image the portions of interest of the substrate that are substantially uniformly or critically illuminated. In one configuration, the substrate is compared to the expected characteristic features prestored in memory. In a second configuration ...