61
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Renesting interaction map into design for efficient long range calculations. International Business Machines Corporation, DeLio & Peterson, Kelly M Nowak, Steven Capella, October 7, 2008: US07434196

Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map ...


62
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Performance in model-based OPC engine utilizing efficient polygon pinning method. International Business Machines Corporation, DeLio & Peterson, Kelly M Nowak, Joseph P Abate, August 10, 2010: US07774737

Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices re ...


63
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Performance in model-based OPC engine utilizing efficient polygon pinning method. International Business Machines Corporation, DeLio & Peterson, Kelly M Nowak, Steven Capella, October 23, 2007: US07287239

Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices re ...


64
Bette L Bergman Reuter, David L DeMaris, Mark A Lavin, William C Leipold, Daniel N Maynard, Maharaj Mukherjee: System for search and analysis of systematic defects in integrated circuits. International Business Machines Corporation, Gibb I P Law Firm, Richard M Kotulak Esq, June 23, 2009: US07552417

Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes ...


65
Mark A Lavin, Maharaj Mukherjee, Alan E Rosenbluth: Rendering a mask using coarse mask representation. International Business Machines Corporation, Steven Capella, Hoffman Warnick, December 6, 2011: US08073288

A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask repr ...


66
Mark A Lavin, Thomas Ludwig, Gregory A Northrop, Robert T Sayah: Gridded glyph geometric objects (L3GO) design method. International Business Machines Corporation, Law Offices of Charles W Peterson Jr, Steven Capella Esq, April 16, 2013: US08423947

A method of gridded glyph geometric objects (L3GO) integrated circuit (IC) design, wherein at least one inter-level connect in a L3GO circuit design is represented as a point matrix glyph (PMG) on a L3GO grid. Each PMG connects a pair of conductors on the next adjacent (above and below) layer and in ...


67
Ulrich A Finkler, Mark A Lavin, Robert T Sayah: Pseudo-string based pattern recognition in L3GO designs. International Business Machines Corporation, Brian Verminski, Hoffman Warnick, October 26, 2010: US07823094

A system and method for processing glyph-based data associated with generating very large scale integrated circuit (VLSI) designs. A system is provide that includes a serialization system for converting an input region of glyph design data into a pseudo-string; and a pattern searching system that id ...


68
Lars W Liebmann, Richard A Ferguson, Allen H Gabor, Mark A Lavin: Binary OPC for assist feature layout optimization. International Business Machines Corporation, Todd M C Li, September 2, 2004: US20040170905-A1

A method of forming a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements on a mask for correcting for proximity effects for a pattern imaged comprising the steps of developing a layout of mask features for printing main pattern features. Provide a table of SRAF element ...


69
Maharaj Mukherjee, Zachary Baum, Mark A Lavin, Donald J Samuels, Rama N Singh: Method for adaptive segment refinement in optical proximity correction. International Business Machines Corporation, International Business Machines Corporation, Dept 18g, March 10, 2005: US20050055658-A1

A method of designing lithographic masks is provided where mask segments used in a model-based optical proximity correction (MBOPC) scheme are adaptively refined based on local image information, such as image intensity, gradient and curvature. The values of intensity, gradient and curvature are eva ...


70
Bette L Bergman Reuter, David L DeMaris, Mark A Lavin, William C Leipold, Daniel N Maynard, Maharaj Mukherjee: System for search and analysis of systematic defects in integrated circuits. Frederick W Gibb Iii, Gibb & Rahman, September 13, 2007: US20070211933-A1

Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes ...



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