51
Lars W Liebmann, Carlos A Fonseca, Ioana Graur, Mark A Lavin: Alternating phase shift mask design with optimized phase shapes. International Business Machines Corporation, Todd M C Li, August 9, 2005: US06927005 (2 worldwide citation)

A method is described for designing an alternating phase shifted mask (altPSM) by optimally selecting the width of phase shapes. The selection of optimal phase shape widths is achieved by providing a lithography metric that describes the relationship between phase shape width and the target image di ...


52
Philip N Strenski, Mark A Lavin: Using layout enumeration to facilitate integrated circuit development. International Business Machines Corporation, Cantor Colburn, Dan Schnurmann, May 14, 2013: US08443322 (2 worldwide citation)

A method for using layout enumeration to facilitate integrated circuit development includes defining an initial set of design ground rules represented in a notation compatible with a coarse placement grid, for a given layer(s) of an integrated circuit device; defining an initial region of interest f ...


53
Ulrich A Finkler, Mark A Lavin, Robert T Sayah: Graph-based pattern matching in L3GO designs. International Business Machines Corporation, Brian Verminski, Hoffman Warnick, October 12, 2010: US07814443 (2 worldwide citation)

A system and method for processing glyph-based data associated with generating very large scale integrated circuit (VLSI) designs. A system is provide that includes a system for defining variable patterns using a pattern description language to create a glyph layout; and a graph-based pattern matchi ...


54
Timothy G Dunham, Ezra D B Hall, Howard S Landis, Mark A Lavin, William C Leipold: Shapes-based migration of aluminum designs to copper damascene. International Business Machines Corporation, Schmeiser Olsen & Watts, Steven Capella, March 3, 2009: US07498250 (1 worldwide citation)

An interconnect structure, method of fabricating the interconnect structure and method of designing the interconnect structure for use in semiconductor devices. The interconnect structure includes a damascene metal wire having a pattern of dielectric filled holes.


55
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Performance in model-based OPC engine utilizing efficient polygon pinning method. International Business Machines Corporation, DeLio & Peterson, Kelly M Novak, Stevn Capella, July 20, 2010: US07761839 (1 worldwide citation)

Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices re ...


56
Mark A Lavin, Ruchir Puri, Louise H Trevillyan, Hua Xiang: Stage mitigation of interconnect variability. International Business Machines Corporation, Brian Verminski, Hoffman Warnick, April 19, 2011: US07930669 (1 worldwide citation)

The present invention provides a method, system and program product for mitigating effects of interconnect variability during a design stage of a chip. Under the technique of the present invention, a global and detailed routing of interconnects of the chip are determined. Thereafter, a dummy fill es ...


57
Ioana Graur, Young O Kim, Mark A Lavin, Lars W Liebmann: System for coloring a partially colored design in an alternating phase shift mask. International Business Machines Corporation, DeLio & Peterson, Peter W Peterson, March 30, 2010: US07687207 (1 worldwide citation)

A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design. Phase units are binary colorable within each unit of the hierarchical circuit design, e.g., cell, an array, a net, or array of nets and/or cells, the phase shapes. The assignment of phas ...


58
Lars W Liebmann, Carlos A Fonseca, Ioana Graur, Mark A Lavin: Alternating phase shift mask design with optimized phase shapes. International Business Machines Corporation, International Business Machines Corporation, Dept 18g, May 15, 2003: US20030093766-A1 (1 worldwide citation)

A method is described for designing an alternating phase shifted mask (altPSM) by optimally selecting the width of phase shapes. The selection of optimal phase shape widths is achieved by providing a lithography metric that describes the relationship between phase shape width and the target image di ...


59
Lars W Liebmann, Carlos A Fonseca, Ioana Graur, Mark A Lavin: Alternating phase shift mask design with optimized phase shapes. IBM Corp Zip 482, September 9, 2004: US20040175635-A1 (1 worldwide citation)

A method is described for designing an alternating phase shifted mask (altPSM) by optimally selecting the width of phase shapes. The selection of optimal phase shape widths is achieved by providing a lithography metric that describes the relationship between phase shape width and the target image di ...


60
Timothy G Dunham, Ezra D B Hall, Howard S Landis, Mark A Lavin, William C Leipold: Shapes-based migration of aluminum designs to copper damascene. International Business Machines Corporation, Schmeiser Olson & Watts, Yuanmin Cai, May 4, 2010: US07709967

An interconnect structure, method of fabricating the interconnect structure and method of designing the interconnect structure for use in semiconductor devices. The interconnect structure includes a damascene metal wire having a pattern of dielectric filled holes.



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