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Fook Luen Heng, Mark A Lavin, Jin Fuw Lee, Daniel L Ostapko, Alan E Rosenbluth, Nakgeuon Seong: Lithographic process window optimization under complex constraints on edge placement. International Business Machines Corporation, Scully Scott Murphy & Presser P C, William H Steinberq Esq, September 11, 2007: US07269817 (7 worldwide citation)

A method and system for layout optimization relative to lithographic process windows which facilitates lithographic constraints to be non-localized in order to impart a capability of printing a given circuit with a process window beyond the process windows which are attainable with conventional simp ...


32
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman, Zheng Chen, Maharaj Mukherjee: Fast and accurate optical proximity correction engine for incorporating long range flare effects. International Business Machines Coporation, H Daniel Schnurmann, October 31, 2006: US07131104 (7 worldwide citation)

A method is described for performing model-based optical proximity corrections on a mask layout used in an optical lithography process having a plurality of mask shapes. Model-based optical proximity correction is performed by computing the image intensity on selected evaluation points on the mask l ...


33
John M Cohn, James A Culp, Ulrich A Finkler, Fook Luen Heng, Mark A Lavin, Jin Fuw Lee, Lars W Liebmann, Gregory A Northrop, Nakgeuon Seong, Rama N Singh, Leon Stok, Pieter J Woeltgens: Physical design system and method. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Eustus D Nelson Esq, June 25, 2013: US08473885 (6 worldwide citation)

A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit genera ...


34
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Renesting interaction map into design for efficient long range calculations. International Business Machines Corporation, DeLio & Peterson, Kelly M Nowak, Steven Capella, May 30, 2006: US07055126 (6 worldwide citation)

Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map ...


35
Robert S Jaffe, Mark A Lavin, Rick A Rand, Paul Schreiner: Exposure compensation for a line scan camera. International Business Machines, Perman & Green, April 24, 1990: US04920429 (6 worldwide citation)

A scanning imager is described which includes a line camera and a table to mechanically present successive regions of an item to be imaged. The time of exposure of the camera for each successive region presented is controlled by encoding strips connected to the table. Thus, if the table is subjected ...


36
James A Culp, Mark A Lavin, Robert T Sayah: Method for performing monte-carlo simulations to predict overlay failures in integrated circuit designs. International Business Machines Corporation, DeLio & Peterson, Peter W Peterson, H Daniel Schnurmann, May 10, 2005: US06892365 (6 worldwide citation)

A method of predicting overlay failure of circuit configurations on adjacent, lithographically produced layers of a semiconductor wafer comprises providing design configurations for circuit portions to be lithographically produced on one or more adjacent layers of a semiconductor wafer, and then pre ...


37
Ioana Graur, Young O Kim, Mark A Lavin, Lars W Liebmann: System for coloring a partially colored design in an alternating phase shift mask. International Business Machines Corporation, DeLio & Peterson, Peter W Peterson, Todd M C Li, May 27, 2008: US07378195 (6 worldwide citation)

A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design. Phase units are binary colorable within each unit of the hierarchical circuit design, e.g., cell, an array, a net, or array of nets and/or cells, the phase shapes. The assignment of phas ...


38
David L DeMaris, Mark A Lavin, William C Leipold, Daniel N Maynard, Maharaj Mukherjee: method for generating a set of test patterns for an optical proximity correction algorithm. International Business Machines Corporation, Richard M Kotulak, Hoffman Warnick, July 22, 2008: US07404174 (5 worldwide citation)

A method of synthesizing layout patterns to test an optical proximity correction algorithm. The method comprises the steps of: embodying Walsh patterns in a set of Walsh pattern matrices; processing groups of matrices from the set of Walsh pattern matrices to form a set of test matrices; mapping the ...


39
Gregg M Gallatin, Emanuel Gofman, Kafai Lai, Mark A Lavin, Maharaj Mukherjee, Dov Ramm, Alan E Rosenbluth, Shlomo Shlafman: Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare. International Business Machines Corporation, DeLio & Peterson, Robert Curcio, Steven Capella, March 11, 2008: US07343271 (4 worldwide citation)

A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimen ...


40
Mark A Lavin, Robert T Sayah, William F Pokorny, Young O Kim: Method for selecting hierarchical interactions in a hierarchical shapes processor. International Business Machines Corporation, F Chau & Associates, June 5, 2001: US06243854 (4 worldwide citation)

The method for selecting hierarchical interaction in a hierarchical shapes processor increases the operator's access and control over the handling of the design's hierarchical structure. The shapes of each cell are considered in accordance with a specified hierarchical relationship having ...



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