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Lars W Liebmann, Richard A Ferguson, Allen H Gabor, Mark A Lavin: Binary OPC for assist feature layout optimization. International Business Machines Corporation, Todd M C Li, December 12, 2006: US07147976 (16 worldwide citation)

A method of forming a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements on a mask for correcting for proximity effects for a pattern imaged comprising the steps of developing a layout of mask features for printing main pattern features. Provide a table of SRAF element ...


22
Mark A Lavin: Method for performing morphic transformations on image data in a general purpose computer. International Business Machines Corporation, Terry J Ilardi, Thomas P Dowd, October 24, 1989: US04876733 (16 worldwide citation)

A method for carrying out morphic transformations with minimal memory accesses by using a two step convolving sequence to form an intermediate image. The components of the intermediate image are used in a recursive process to provide the desired final convolution. The word resulting from this convol ...


23
Timothy G Dunham, Ezra D B Hall, Howard S Landis, Mark A Lavin, William C Leipold: Shapes-based migration of aluminum designs to copper damascene. International Business Machines Corporation, Lawrence P Fraley, Schmeiser Olsen & Watts, March 4, 2003: US06528883 (15 worldwide citation)

An interconnect structure for use in semiconductor devices which interconnects a plurality of dissimilar metal wiring layers, which are connected vias, by incorporating shaped voids in the metal layers. The invention also discloses a method by which such structures are constructed.


24
Gary S Ditlow, Fook Luen Heng, Mark A Lavin, Daniel L Ostapko, Jung H Yoon: Partitioned mask layout. International Business Machines Corporation, Ference & Associates, May 7, 2002: US06383847 (14 worldwide citation)

In connection with the manufacture of chips having partitioned logic, a partitioned mask layout approach. This approach provides the chip exposure pattern as a set of partitions corresponding to macros or core functions and also handles glue logic and interconnect. A result of this approach is a sim ...


25
Young O Kim, Mark A Lavin, Lars W Liebmann, Glenwood S Weinert: Automatic generation of phase shift masks using net coloring. International Business Machines Corporation, H Daniel Schnurmann, Schmeiser Olsen & Watts, March 16, 1999: US05883813 (12 worldwide citation)

According to the preferred embodiment, a method is provided for automatically coloring VLSI design elements for the purpose of assigning binary properties to the elements. The preferred method is particularly applicable for use generating phase shift mask designs from VLSI CAD datasets. The preferre ...


26
Mark A Lavin, Lars W Liebmann: Efficient generation of negative fill shapes for chips and packages. International Business Machines Corporation, Stephen C Kaufman, Whitham Curtis Whitham & McGinn, September 23, 1997: US05671152 (12 worldwide citation)

An efficient method for modifying a chip or package design allows for the creation of small shapes without excessive expansion of design data. A computer program takes a physical design, represented in a computer data file, and generates a modified version of the design in which fill holes have been ...


27
Mark A Lavin, Ruchir Puri, Louise H Trevillyan, Hua Xiang: Design stage mitigation of interconnect variability. International Business Machines Corporation, Brian Verminski, Hoffman Warnick, November 4, 2008: US07448014 (11 worldwide citation)

The present invention provides a method, system and program product for mitigating effects of interconnect variability during a design stage of a chip. Under the technique of the present invention, a global and detailed routing of interconnects of the chip are determined. Thereafter, a dummy fill es ...


28
Lars W Liebmann, Carlos A Fonseca, Ioana Graur, Mark A Lavin: Alternating phase shift mask design with optimized phase shapes. International Business Machines Corporation, Todd M C Li, June 29, 2004: US06757886 (11 worldwide citation)

A method is described for designing an alternating phase shifted mask (altPSM) by optimally selecting the width of phase shapes. The selection of optimal phase shape widths is achieved by providing a lithography metric that describes the relationship between phase shape width and the target image di ...


29
Timothy G Dunham, Ezra D B Hall, Howard S Landis, Mark A Lavin, William C Leipold: Shapes-based migration of aluminum designs to copper damascence. International Business Machines Corporation, Schmeiser Olsen & Watts, William H Steinberg, January 31, 2006: US06992002 (8 worldwide citation)

An interconnect structure for use in semiconductor devices which interconnects a plurality of dissimilar metal wiring layers, which are connected vias, by incorporating shaped voids in the metal layers. The invention also discloses a method by which such structures are constructed.


30
Timothy G Dunham, Ezra D B Hall, Howard S Landis, Mark A Lavin, William C Leipold: Shapes-based migration of aluminum designs to copper damascene. International Business Machines Corporation, Schmeiser Olsen & Watts, William H Steinberg, December 25, 2007: US07312141 (7 worldwide citation)

An interconnect structure, method of fabricating the interconnect structure and method of designing the interconnect structure for use in semiconductor devices. The interconnect structure includes a damascene metal wire having a pattern of dielectric filled holes.



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