1
Richard A Ferguson, Mark A Lavin, Lars W Liebmann, Alfred K Wong: Process window based optical proximity correction of lithographic images. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, June 10, 2003: US06578190 (212 worldwide citation)

A method of creating a pattern for a mask adapted for use in lithographic production of features on a substrate. The method comprises initially providing a mask pattern of a feature to be created on the substrate using the mask. The method then includes establishing target dimensional bounds of the ...


2
Puneet Gupta, Fook Luen Heng, Mark A Lavin: Method of IC fabrication, IC mask fabrication and program product therefor. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Louis J Percello Esq, Brian P Verminski Esq, April 1, 2008: US07353492 (166 worldwide citation)

A method of forming integrated circuit (IC) chip shapes and a method and computer program product for converting an IC design to a mask, e.g., for standard cell design. Individual book/macro physical designs (layouts) are proximity corrected before unnesting and an outer proximity range is determine ...


3
Syed M Alam, Ibrahim M Elfadel, Kathryn W Guarini, Meikei Ieong, Prabhakar N Kudva, David S Kung, Mark A Lavin, Arifur Rahman: Three dimensional integrated circuit. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Louis J Percello Esq, Rafael Perez Piniero Esq, December 25, 2007: US07312487 (116 worldwide citation)

A three dimensional (3D) integrated circuit (IC), 3D IC chip and method of fabricating a 3D IC chip. The chip includes multiple layers of circuits, e.g., silicon insulator (SOI) CMOS IC layers, each including circuit elements. The layers may be formed in parallel and one layer attached to another to ...


4
Syed M Alam, Ibrahim M Elfadel, Kathryn W Guarini, Meikei Ieong, Prabhakar N Kudva, David S Kung, Mark A Lavin, Arifur Rahman: Three dimensional integrated circuit and method of design. International Business Machines Corporation, Law Office of Charles W Peterson Jr, Brian P Verminski Esq, May 25, 2010: US07723207 (84 worldwide citation)

A three dimensional (3D) integrated circuit (IC), 3D IC chip and method of fabricating a 3D IC chip. The chip includes multiple layers of circuits, e.g., silicon insulator (SOI) CMOS IC layers, each including circuit elements. The layers may be formed in parallel and one layer attached to another to ...


5
Mark A Lavin, William C Leipold: Variable density fill shape generation. International Business Machines Corporation, Howard J Walter Jr, July 13, 1999: US05923563 (57 worldwide citation)

The present invention is directed to a method for adding fill shapes to a chip in a manner which accommodates a wide range of within-chip pattern density variations and provides a tight pattern density control (i) within a chip and (ii) from chip to chip. The present invention imposes a grid over a ...


6
Archibald J Allen, Wilm E Donath, Alan D Dziedzic, Mark A Lavin, Daniel N Maynard, Dennis M Newns, Gustavo E Tellez: Method for prediction random defect yields of integrated circuits with accuracy and computation time controls. International Business Machines Corporation, Richard M Kotulak Esq, McGinn & Gibb PLLC, May 18, 2004: US06738954 (57 worldwide citation)

A method of computing a manufacturing yield of an integrated circuit having device shapes includes sub-dividing the integrated circuit into failure mechanism subdivisions (each of the failure mechanism subdivisions includes one or more failure mechanism and each of the failure mechanisms includes on ...


7
Lars W Liebmann, Mark A Lavin, Pia N Sanda: Geometric autogeneration of "hard" phase-shift designs for VLSI. International Business Machines Corporation, Charles W Peterson, Whitham Curtis Whitham & McGinn, July 16, 1996: US05537648 (54 worldwide citation)

A method implemented in a computer aided design (CAD) system automatically generates phase shifted mask designs for very large scale integrated (VLSI) chips from existing circuit design data. The system uses a series of basic geometric operations to design areas requiring phase assignment, resolve c ...


8
Lars W Liebmann, Ioana C Graur, Young O Kim, Mark A Lavin, Alfred K Wong: Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith. International Business Machines Corporation, Pollock Vande Sande & Amernick, May 2, 2000: US06057063 (50 worldwide citation)

A process for creating and verifying a design of phase-shifted masks utilizing at least one phase shift region employing a computer-aided design system. A chip design is provided. A phase-shift mask design capable of producing the chip design is created. Features in a design of the phase-shifted mas ...


9
Young O Kim, Mark A Lavin, Lars W Liebmann, Glenwood S Weinert: Automatic generation of phase shift masks using net coloring. International Business Machines Corporation, H Daniel Schnurmann, Schmeiser Olsen & Watts, May 23, 2000: US06066180 (42 worldwide citation)

According to the preferred embodiment, a method is provided for automatically coloring VLSI design elements for the purpose of assigning binary properties to the elements. The preferred method is particularly applicable for use generating phase shift mask designs from VLSI CAD datasets. The preferre ...


10
Lars W Liebmann, Mark A Lavin, Pia N Sanda: Geometric autogeneration of"hard"phase-shift designs for VLSI. International Business Machines Corporation, Charles W Peterson Jr, Whitham Curtis Whitham & McGinn, June 3, 1997: US05636131 (40 worldwide citation)

An apparatus implemented in a computer aided design (CAD) system automatically generates phase shifted mask designs for very large scale integrated (VLSI) chips from existing circuit design data. The system uses a series of basic geometric operations to design areas requiring phase assignment, resol ...



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