1
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 9, 2007: US07161659 (157 worldwide citation)

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


2
Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Erik Roelof Loopstra: Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 15, 2009: US07589818 (41 worldwide citation)

A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment ...


3
Harm Roelof Rossing, Marinus Aart Van Den Brink, Richard Alexander George: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 16, 2006: US07046331 (9 worldwide citation)

A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a res ...


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Marinus Aart Van Den Brink, Hans Butler, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Georgo Angelis, Renatus Gerardus Klaver, Martijn Robert Hamers, Boudewijn Theodorus Verhaar, Peter Hoekstra: Lithographic apparatus and calibration method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, August 21, 2012: US08248583 (1 worldwide citation)

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal ...


6
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, July 3, 2018: USRE046933

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


7
Marinus Aart Van Den Brink, Joezf Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 20, 2013: USRE044446

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


8
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, June 23, 2015: USRE045576

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


9
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 14, 2012: USRE043576

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


10
Harm Roelof Rossing, Marinus Aart Van Den Brink, Richard Alexander George: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Asml Netherlands, Pillsbury Winthrop, November 13, 2003: US20030211297-A1

A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a res ...