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Maria Elisabeth Reuhman Huisken, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma: Method of characterization, method of characterizing a process operation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07410735 (4 worldwide citation)

A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a da ...


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Christianus Gerardus Maria De Mol, Maria Elisabeth Reuhman Huisken: Methods of characterizing similarity or consistency in a set of entities. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 29, 2011: US07916275 (1 worldwide citation)

A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation ...


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Christianus Gerardus Maria De Mol, Maria Elisabeth Reuhman Huisken: Methods of characterizing similarity between measurements on entities, computer programs product and data carrier. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 15, 2011: US07889318

A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function hav ...


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Maria Elisabeth Reuhman Huisken, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma: Method of characterization, method of characterizing a process operation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, February 10, 2005: US20050031975-A1

A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a da ...


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Maria Elisabeth Reuhman Huisken, Leon Martin Levasier, Tasja Van Rhee, Rosaria Salpietro, Erik Johannes Schoemaker, Eric Jacqmin, Martin Prins, Marcel Nicolaas Jacobus Van Kervinck, Timotheus Marc Vincent Bootsma: System and method of monitoring and diagnosing system condition and performance. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 4, 2007: US20070002295-A1

The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process for identifying the source of the problem and enabling action to be taken before defects are detected o ...


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Christianus Gerardus Maria DE MOL, Maria Elisabeth REUHMAN HUISKEN: Methods of characterizing similarity or consistency in a set of entities. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, March 19, 2009: US20090073403-A1

A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation ...


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Christianus Gerardus Maria DE MOL, Maria Elisabeth Reuhman Huisken: Methods of Characterizing Similarity Between Measurements on Entities, Computer Programs Product and Data Carrier. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, March 19, 2009: US20090076999-A1

A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function hav ...