1
Joeri Lof, Johannes Catharinus Hubertus Mulkens, Jeroen Johannes Sophia Maria Mertens, Antonius Johannes Van Der Net, Ronald Van Der Ham, Nicolas Lallemant, Marcel Beckers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 6, 2006: US07057702 (77 worldwide citation)

A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-sec ...


2
Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Joost Jeroen Ottens, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 28, 2010: US07804577 (12 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...


3
Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411654 (9 worldwide citation)

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr ...


4
Marcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411658 (5 worldwide citation)

A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projecti ...


5
Bob Streefkerk, Roelof Frederik De Graaf, Johannes Catharinus Hubertus Mulkens, Marcel Beckers, Paul Petrus Joannes Berkvens, David Lucien Anstotz: Methods relating to immersion lithography and an immersion lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 19, 2013: US08587762 (5 worldwide citation)

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedia ...


6
Martinus Hendrikus Antonius Leenders, Nicolaas Ten Kate, Marcel Beckers, Johannes Petrus Maria Smeulers, Michel Riepen, Sergei Shulepov, Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 16, 2013: US08421996 (3 worldwide citation)

A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such t ...


7
Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrickus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 5, 2010: US07808614 (3 worldwide citation)

An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantiall ...


8
Carlo Cornelis Maria Luijten, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Martinus Hendrickus Antonius Leenders, Erik Roelof Loopstra, Bob Streefkerk, Marcel Beckers, Herman Boom, Richard Moerman: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 21, 2009: US07522261 (3 worldwide citation)

An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantiall ...


9
Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, November 10, 2015: US09182678 (3 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the subs ...


10
Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Franciscus Johannes Joseph Janssen, Ivo Adam Johannes Thomas: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 31, 2012: US08233134 (3 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the subs ...