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Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu: Compound, polymer, and radiation-sensitive composition. JSR Corporation, Ditthavong Mori & Steiner P C, October 12, 2010: US07812105 (16 worldwide citation)

A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling i ...


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Susumu Miyashita, Makoto Sugiura: Coated molded article. Toyo Ink Manufacturing, Wenderoth Lind & Ponack, September 28, 1993: US05248553 (14 worldwide citation)

A coated molded article obtained by coating a lacquer containing an organic solvent on a molded article produced from a resin composition comprising 100 parts by weight of one resin selected from the group consisting of an acrylonitrile-butadiene-styrene terpolymer resin, a mixture of said terpolyme ...


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Atsushi Shiota, Takahiko Kurosawa, Eiji Hayashi, Makoto Sugiura, Toshiyuki Akiike, Keiji Konno, Tadahiro Shiba, Kohei Goto, Kinji Yamada: Film-forming composition. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, June 18, 2002: US06406794 (14 worldwide citation)

A film-forming composition comprising: (A) at least one silane compound selected from the group consisting of a compound shown by the following formula (1), a compound shown by the following formula (2), and a compound shown by the following formula (3) and a hydrolysis condensate of these compounds ...


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Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu: Sulfonium compound. JSR Corporation, Ditthavong Mori & Steiner P C, March 1, 2011: US07897821 (12 worldwide citation)

A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alk ...


5
Hiroshi Kajita, Akihiro Kondoh, Makoto Sugiura, Nobuhiro Nishioka, Masahiko Fukano, Eiji Gotoh, Satoshi Tanaka, Takeshi Matsuo: Image Forming apparatus and roll paper cutting machine. Mita Industrial, Jordan and Hamburg, December 27, 1994: US05375494 (7 worldwide citation)

A roll paper cutting device is attachable to the main body of an image forming apparatus main body. The roll paper cutting device includes a cutter for cutting the paper of a roll of paper contained therein, as well as an arrangement for feeding the cut sheet to the image forming apparatus. The roll ...


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Mitsutoshi Takemoto, Makoto Sugiura, Hiroshi Kajita: Cleaning unit of a copying apparatus. Mita Industrial, Koda and Androlia, March 24, 1992: US05099280 (6 worldwide citation)

In a cleaning unit for a copying apparatus wherein a part of the photoreceptive drum and adjacent cleaning unit can be exposed by moving a movable part of the copying apparatus in a direction of movement at a right angle to the axis of the photoreceptive drum. This movement allows a main charger ins ...


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Hiroshi Kajita, Akihiro Kondoh, Makoto Sugiura, Nobuhiro Nishioka, Masahiko Fukano, Eiji Gotoh, Satoshi Tanaka, Takeshi Matsuo: Image forming apparatus and roll paper cutting device. Mita Industrial, Jordan and Hamburg, June 1, 1993: US05216471 (6 worldwide citation)

An image forming apparatus has an image forming apparatus main body with a sheet inlet. The main body is arranged to form an image on a sheet inserted into the sheet inlet. A roll paper cutting device contains roll paper and includes a cutting arrangement for cutting the roll paper and discharging c ...


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Shin ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura: Composition for forming resist underlayer film and method for forming pattern. JSR Corporation, Ditthavong Mori & Steiner P C, August 20, 2013: US08513133 (5 worldwide citation)

A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, wherein R3 to R8 individually represent a group shown by the following formul ...


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Mitsuo Sato, Kazuo Nakahara, Hiromitsu Nakashima, Takanori Nakano, Makoto Sugiura: Radiation-sensitive resin composition and compound. JSR Corporation, Ditthavong Mori & Steiner P C, September 25, 2012: US08273521 (3 worldwide citation)

A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structu ...