1
Su Liu
Li Li, Su Liu, Azubuike Victor Onwuta, Aruna Yedavilli: Method to Automatically Display Filenames Encoded in Multiple Code Sets. International Business Machines Corporation, May 31, 2012: US20120137218-A1

A computer implemented method, computer program product, and computer system for viewing content encoded in at least one code set and stored in a file system. A computer identifies a unified code set covering all characters used in the file system. The computer, responsive to a user input to view th ...


2
Li Li, Jerzy A Dobrowolski, Peter D Grant, Brian T Sullivan: Color deformable mirror device having optical thin film interference color coatings. National Research Council of Canada, Neil Teitelbaum & Associates, April 8, 1997: US05619059 (231 worldwide citation)

A semiconductor device comprises a plurality of colored deformable mirrors controllable by electrical circuitry. Groups of mirrors, responsive to the electronic signals, are selectably operable to reflect incident light. The deformable mirrors are coated with an optical thin film interference color ...


3
Zhiqiang Wu, Li Li, Thomas A Figura, Kunal R Parekh, Pai Hung Pan, Alan R Reinberg, Kin F Ma: Material removal method for forming a structure. Micron Technology, Workman Nydegger & Seeley, July 17, 2001: US06261964 (156 worldwide citation)

Methods are disclosed for forming shaped structures from silicon and/or germanium containing material with a material removal process that is selective to low stress portions of the material. In general, the method initially provides a layer of the material on a semiconductor substrate. The material ...


4
Janos Fucsko, Grady S Waldo, Kevin J Torek, Li Li: Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum. Micron Technology, Wells St John P S, April 18, 2006: US07030034 (97 worldwide citation)

A method of etching silicon nitride substantially selectively relative to an oxide of aluminum includes providing a substrate comprising silicon nitride and an oxide of aluminum. The silicon nitride and the oxide is exposed to an etching solution comprising HF and an organic HF solvent under conditi ...


5
Ian C Ashurst, Craig S Herman, Li Li, Michael T Riebe: Metered dose inhaler for salmeterol. Glaxo Wellcome, Glaxo Group, Charles E Dadswell, November 7, 2000: US06143277 (82 worldwide citation)

A metered dose inhaler having part or all of its internal metallic surfaces coated with one or more fluorocarbon polymers, in combination with one or more non-fluorocarbon polymers, for dispensing an inhalation drug formulation comprising salmeterol, or a salt thereof, and a fluorocarbon propellant, ...


6
Kunal R Parekh, Li Li: Method of forming trench isolation region for semiconductor device. Micron Technology, Workman Nydegger & Seeley, January 16, 2001: US06174785 (80 worldwide citation)

Shallow trench isolation regions in a semiconductor device are formed by utilizing sacrificial spacers such as polysilicon spacers having a rounded shape to form trench isolation areas. The spacer shape is transferred into a semiconductor substrate during an etching process to define the profile of ...


7
Li Li: Optical recording media having optically-variable security properties. National Research Council of Canada, Neil Teitelbaum & Associates, August 27, 1996: US05549953 (76 worldwide citation)

The prevention of counterfeiting of currencies, passports, cheques, bank cards, credit cards, optical disks and the like is addressed by introducing thin film structures having both optically-variable security properties and encoded optical data decodable by optical means. The thin film structures c ...


8
Li Li, Donald L Westmoreland, Richard C Hawthorne deceased, Kevin Torek: Method of wafer cleaning, and system and cleaning solution regarding same. Micron Technology, Mueting Raasch & Gebhardt P A, July 21, 1998: US05783495 (71 worldwide citation)

A method of cleaning wafer surfaces includes providing a wafer surface and cleaning the wafer surface using at least hydrofluoric acid (HF) and an etch reducing component. The etch reducing component is from the group of (R).sub.4 NOH wherein R=(C.sub.1 -C.sub.20)alkyls, either straight or branch ch ...


9
Ian Carl Ashurst, Craig Steven Herman, Li Li Bovet, Michael Thomas Riebe: Metered dose inhaler for albuterol. Glaxo Wellcome, Glaxo Group, Charles E Dadswell, October 17, 2000: US06131566 (68 worldwide citation)

A metered dose inhaler having all or part of its internal surfaces coated with one or more fluorocarbon polymers, optimally a blend of one or more fluorocarbon polymers in combination with one or more non-fluorocarbon polymers, for dispensing an inhalation drug formation comprising albuterol or a ph ...


10
Janos Fucsko, John A Smythe III, Li Li, Grady S Waldo: Low temperature process for polysilazane oxidation/densification. Micron Technology, Whyte Hirschboeck Dudek SC, April 21, 2009: US07521378 (68 worldwide citation)

Semiconductor devices, structures and systems that utilize a polysilazane-based silicon oxide layer or fill, and methods of making the oxide layer are disclosed. In one embodiment, a polysilazane solution is deposited on a substrate and processed with ozone in a wet oxidation at low temperature to c ...



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